Dr. Olger Zwier
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 10 April 2024 Poster + Paper
Proceedings Volume 12955, 129553P (2024) https://doi.org/10.1117/12.3012950
KEYWORDS: Overlay metrology, Signal to noise ratio, Denoising, Semiconducting wafers, Metrology, Inspection, Phase shifts, Optical gratings, Industrial applications, Diffraction

Proceedings Article | 26 May 2022 Presentation + Paper
Proceedings Volume 12053, 1205316 (2022) https://doi.org/10.1117/12.2627719
KEYWORDS: Overlay metrology, Diffraction gratings, Semiconducting wafers, Phase measurement, Phase shifts, Diffraction, Optical testing, Optical metrology, Optical design, Etching

Proceedings Article | 22 February 2021 Presentation + Paper
Masazumi Matsunobu, Toshiharu Nishiyama, Michio Inoue, Richard Housley, Cornel Bozdog, Justin Lim, Brian Watson, Jason Reece, Steve McCandless, Olger Zwier, Maurits van der Schaar, Murat Bozkurt, Masudur al Arif, Elliott McNamara, Pieter Kapel, Alan Khan, Simon Strom, Paul Turner, Ping Olson, Ewoud van West
Proceedings Volume 11611, 1161126 (2021) https://doi.org/10.1117/12.2584759
KEYWORDS: Overlay metrology, Diffraction, Diffraction gratings, Semiconducting wafers

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top