Ms. Aileen Soco Profile

Aileen Soco

Project leader at ASML Netherlands BV

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Publications (6)

Proceedings Article | 10 April 2024 Poster + Paper

Optical diffraction-based methodology to measure on-product EUV exposure focus variations

Willem op 't Root, Jungwan Park, Youngsun Nam, Seho Kim, Hyunwoo Hwang, Jeong Heung Kong, Sang-Ho Yun, Youngseog Kang, Bram Klaassen, Karel van den Bos, Zhe Hou, Aileen Soco, Don Cheon, Jong-Hyuk Yim, Hong-seung Song, Mi-Yeon Baek

Proceedings Volume 12955, 129552Q (2024) https://doi.org/10.1117/12.3010370

KEYWORDS: Semiconducting wafers, Metrology, Extreme ultraviolet lithography, Calibration, Extreme ultraviolet, Diffraction gratings, Scanners, Diffraction, Printing, Optical metrology

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Proceedings Article | 26 May 2022 Presentation + Paper

Improved multi-lot overlay performance via phase-based ADI overlay measurements

Doogyu Lee, Jungmin Lee, Eunji Lee, Jeongjin Lee, Seung Yoon Lee, Chan Hwang, Pieter Kapel, Seung-Bin Yang, Mi-Yeon Baek, Jeroen Wefers Bettink, Se-Ra Jeon, Thomas Kim, Aileen Soco, Olger Zwier, Koen van Witteveen

Proceedings Volume 12053, 1205316 (2022) https://doi.org/10.1117/12.2627719

KEYWORDS: Overlay metrology, Diffraction gratings, Semiconducting wafers, Phase measurement, Phase shifts, Diffraction, Optical testing, Optical metrology, Optical design, Etching

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Proceedings Article | 26 May 2022 Presentation + Paper

Absolute overlay measurement based on voltage contrast defect inspection with programmed misalignments for DRAM devices

Moosong Lee, Jinsun Kim, Dohyeon Park, Yeeun Han, Junseong Yoon, Seung Yoon Lee, Chan Hwang, Achim Woessner, Cyrus Tabery, Miao Wang, Antonio Corradi, Young-Hoon Song, Yun-A Sung, Thomas Kim, Aileen Soco, Jason Kim, Chih-Hung Hsieh

Proceedings Volume 12053, 1205315 (2022) https://doi.org/10.1117/12.2626721

KEYWORDS: Overlay metrology, Semiconducting wafers, Defect inspection, Metrology, Inspection, Standards development, Image processing, Electronics, Etching, Electrons

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Proceedings Article | 26 March 2019 Paper

Measuring after etch overlay and characterizing tilt fingerprints in multi-tier 3D-NAND structures

Hong-Goo Lee, Dong-Young Lee, Jun-Yeob Kim, Sang-Jun Han, Chan-Ha Park, Jaap Karssenberg, Mir Shahrjerdy, Arno van Leest, Nang-Lyeom Oh, Dong-Hak Lee, Aileen Soco, Tjitte Nooitgedagt

Proceedings Volume 10959, 1095907 (2019) https://doi.org/10.1117/12.2515299

KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Scanners, Etching, Lithography, Scatterometry, Signal detection, Instrument modeling, Optical lithography

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Proceedings Article | 13 March 2018 Presentation + Paper

Unique method for controlling device level overlay with high-NA optical overlay technique using YieldStar in a DRAM HVM environment

Dong-Kiu Park, Hyun-Sok Kim, Moo-Young Seo, Jae-Wuk Ju, Young-Sik Kim, Mir Shahrjerdy, Arno van Leest, Aileen Soco, Giacomo Miceli, Jennifer Massier, Elliott McNamara, Paul Hinnen, Paul Böcker, Nang-Lyeom Oh, Sang-Hoon Jung, Yvon Chai, Jun-Hyung Lee

Proceedings Volume 10585, 105850V (2018) https://doi.org/10.1117/12.2297094

KEYWORDS: Overlay metrology, Metrology, Semiconducting wafers, Control systems, Manufacturing, Etching, Lithography, Critical dimension metrology, Inspection

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Proceedings Article | 28 March 2017 Paper

Application of advanced diffraction based optical metrology overlay capabilities for high-volume manufacturing

Kai-Hsiung Chen, Guo-Tsai Huang, Hung-Chih Hsieh, Wei-Feng Ni, S. M. Chuang, T. K. Chuang, Chih-Ming Ke, Jacky Huang, Shiuan-An Rao, Aysegul Cumurcu Gysen, Maxime d'Alfonso, Jenny Yueh, Pavel Izikson, Aileen Soco, Jon Wu, Tjitte Nooitgedagt, Jeroen Ottens, Yong Ho Kim, Martin Ebert

Proceedings Volume 10145, 1014528 (2017) https://doi.org/10.1117/12.2257894

KEYWORDS: Overlay metrology, Metrology, High volume manufacturing, Scatterometry, Diffraction, Optical metrology, Lithography, Process control, Optical lithography, Time metrology, Image registration, Target acquisition, Semiconducting wafers

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Showing 5 of 6 publications

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