Dr. Vladimir B. Levinski Profile

Dr. Vladimir B. Levinski

Sr. Algorithm Design Engineer at KLA Israel

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Author

Publications (11)

Proceedings Article | 26 May 2022 Poster + Paper

Spectral analysis overlay measurement approach for improvement of overlay accuracy in advanced integrated circuits

Vladimir Levinski, Yuri Paskover, Sharon Aharon, Daria Negri, Nadav Gutman, K. Nireekshan Reddy, Jeongpyo Lee, Hedvi Spielberg, Dongyoung Lee, Hyunjun Kim, Sukwon Park, Bohye Kim, Hongseok Jang, Honggoo Lee, Sangho Lee

Proceedings Volume 12053, 120531Z (2022) https://doi.org/10.1117/12.2613981

KEYWORDS: Semiconducting wafers, Overlay metrology, Process control, Integrated circuits, Wafer-level optics, Scanners, Principal component analysis, Manufacturing, Inspection, Accuracy assessment

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Proceedings Article | 20 March 2020 Presentation + Paper

Optical imaging metrology calibration using high voltage scanning electron microscope at after-development inspection for advanced processes

N. Gutman, I. Tarshish, R. Gronheid, C. Dror, D. Michelsson, H. Backhauss, L. Levin, V. Levinski, Y. Paskover, L. Yerushalmi, T. Heidrich, S. Czerkas, U. Pohlmann, F. Laske

Proceedings Volume 11325, 113251X (2020) https://doi.org/10.1117/12.2551797

KEYWORDS: Scanning electron microscopy, Overlay metrology, Metrology, Calibration, Optical calibration

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Proceedings Article | 30 March 2017 Paper

Process resilient overlay target designs for advanced memory manufacture

Joonseuk Lee, Mirim Jung, Honggoo Lee, Youngsik Kim, Sangjun Han, Michael Adel, Tal Itzkovich, Vladimir Levinski, Victoria Naipak, Anna Golotsvan, Amnon Manassen, Yuri Paskover, Tom Leviant, Efi Megged, Myungjun Lee, Mark Smith, Do-Hwa Lee, DongSub Choi, Zephyr Liu

Proceedings Volume 10145, 1014524 (2017) https://doi.org/10.1117/12.2258376

KEYWORDS: Overlay metrology, Metrology, Lithography, Manufacturing, Semiconducting wafers, Optical lithography, Polarization, Modulation, Critical dimension metrology, Image segmentation

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Proceedings Article | 24 March 2016 Paper

Lithography aware overlay metrology target design method

Myungjun Lee, Mark Smith, Joonseuk Lee, Mirim Jung, Honggoo Lee, Youngsik Kim, Sangjun Han, Michael Adel, Kangsan Lee, Dohwa Lee, Dongsub Choi, Zephyr Liu, Tal Itzkovich, Vladimir Levinski, Ady Levy

Proceedings Volume 9778, 97781L (2016) https://doi.org/10.1117/12.2218653

KEYWORDS: Overlay metrology, Metrology, Lithography, Scanners, Lithographic illumination, Personal protective equipment, Optical lithography, Resolution enhancement technologies, Optical proximity correction, Photomasks, SRAF

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Proceedings Article | 19 March 2015 Paper

Scanner focus metrology for advanced node scanner monitoring and control

Jimyung Kim, Youngsik Park, Taehwa Jeong, Suhyun Kim, Kwang-Sub Yoon, Byoung-il Choi, Vladimir Levinski, Daniel Kandel, Yoel Feler, Nadav Gutman, Eltsafon Island-Ashwal, Moshe Cooper, DongSub Choi, Eitan Herzel, Tien David, JungWook Kim

Proceedings Volume 9424, 94242E (2015) https://doi.org/10.1117/12.2084671

KEYWORDS: Scanners, Photomasks, Metrology, Finite element methods, Semiconducting wafers, Diffraction, Lithography, Phase shifts, Calibration, Scatterometry

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Proceedings Article | 5 April 2012 Paper

Overlay quality metric

Guy Cohen, Eran Amit, Dana Klein, Daniel Kandel, Vladimir Levinski

Proceedings Volume 8324, 832424 (2012) https://doi.org/10.1117/12.916379

KEYWORDS: Process control, Error analysis, Metrology, Quality measurement, Overlay metrology, Precision measurement, Control systems, Scanners, Inspection, Optical lithography

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Proceedings Article | 5 April 2012 Paper

Overlay accuracy fundamentals

Daniel Kandel, Vladimir Levinski, Noam Sapiens, Guy Cohen, Eran Amit, Dana Klein, Irina Vakshtein

Proceedings Volume 8324, 832417 (2012) https://doi.org/10.1117/12.916369

KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Optical filters, Quality measurement, Clouds, Wafer-level optics, Diffraction, Optical simulations, Computer simulations

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Proceedings Article | 14 March 2008 Paper

Diffraction order control in overlay metrology: a review of the roadmap options

Mike Adel, Daniel Kandel, Vladimir Levinski, Joel Seligson, Alex Kuniavsky

Proceedings Volume 6922, 692202 (2008) https://doi.org/10.1117/12.773243

KEYWORDS: Scatterometry, Overlay metrology, Metrology, Diffraction, Imaging systems, Detection and tracking algorithms, Spectroscopy, Optical lithography, Sensors, Image processing

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Proceedings Article | 18 June 2007 Paper

Differential signal scatterometry overlay metrology: an accuracy investigation

Daniel Kandel, Mike Adel, Berta Dinu, Boris Golovanevsky, Pavel Izikson, Vladimir Levinski, Irina Vakshtein, Philippe Leray, Mauro Vasconi, Bartlomiej Salski

Proceedings Volume 6616, 66160H (2007) https://doi.org/10.1117/12.725929

KEYWORDS: Overlay metrology, Scatterometry, Semiconducting wafers, Detection and tracking algorithms, Computer simulations, Silicon, Standards development, Electromagnetism, Metrology, Algorithms

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Proceedings Article | 24 May 2004 Paper

Target noise in overlay metrology

Joel Seligson, Mike Adel, Pavel Izikson, Vladimir Levinski, Dan Yaffe

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.534515

KEYWORDS: Overlay metrology, Aluminum, Reticles, Scanners, Metrology, Back end of line, Metals, Semiconducting wafers, Copper, Diagnostics

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Proceedings Article | 16 July 2002 Paper

Overlay metrology simulations

Joel Seligson, Michael Friedmann, Boris Golovanevsky, Vladimir Levinsky

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473469

KEYWORDS: Overlay metrology, Computer simulations, Metrology, Monochromatic aberrations, Detection and tracking algorithms, Photomasks, Polarization, Silicon, Near field, Semiconductors

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Showing 5 of 11 publications

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