Dr. Colin J. Brodsky Profile

Dr. Colin J. Brodsky

Development Engineer

SPIE Involvement:

Author

Publications (19)

Proceedings Article | 29 March 2013 Paper

Strategy for yield improvement with sub-10nm photochemical filtration

J. Braggin, C. Brodsky, M. Linnane, P. Klymko

Proceedings Volume 8682, 868229 (2013) https://doi.org/10.1117/12.2011478

KEYWORDS: Yield improvement, Digital filtering, Lithography, Back end of line, Optical lithography, Chemistry, Manufacturing, Metrology, Etching, Optics manufacturing

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SPIE Journal Paper | 19 March 2012

Escaping death: single-patterning contact printing for 32/28-nm logic technology nodes

Bradley Morgenfeld, Ian Stobert, Ju Jin An, Massud Aminpur, Colin Brodsky, Alan Thomas, Henning Haffner, Martin Ostermayr, Hideki Kanai, Norman Chen

JM3, Vol. 11, Issue 1, 013010, (March 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.1.013010

KEYWORDS: SRAF, Printing, Optical proximity correction, Optical lithography, Critical dimension metrology, Etching, Logic, Photomasks, Semiconducting wafers, Model-based design

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Proceedings Article | 23 March 2011 Paper

Contact patterning strategies for 32nm and 28nm technology

Bradley Morgenfeld, Ian Stobert, Ju j An, Hideki Kanai, Norman Chen, Massud Aminpur, Colin Brodsky, Alan Thomas

Proceedings Volume 7973, 797319 (2011) https://doi.org/10.1117/12.879773

KEYWORDS: Optical lithography, SRAF, Critical dimension metrology, Etching, Semiconducting wafers, Model-based design, Photomasks, Lithography, Optical proximity correction, Double patterning technology

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Proceedings Article | 7 March 2008 Paper

Measuring layer-specific depth-of-focus requirements

Bernhard Liegl, Allen Gabor, Colin Brodsky, John Cotte, Mahadevaiyer Krishnan

Proceedings Volume 6924, 69244J (2008) https://doi.org/10.1117/12.773382

KEYWORDS: Semiconducting wafers, Sensors, Calibration, Optical lithography, Error analysis, Imaging systems, Image resolution, Metals, Interferometry, Wafer-level optics

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Proceedings Article | 7 March 2008 Paper

Determining DOF requirements needed to meet technology process assumptions

Allen Gabor, Andrew Brendler, Bernhard Liegl, Colin Brodsky, Gerhard Lembach, Scott Mansfield, Shailendra Mishra, Timothy Brunner, Timothy Wiltshire, Vinayan Menon, Wai-kin Li

Proceedings Volume 6924, 69241L (2008) https://doi.org/10.1117/12.773070

KEYWORDS: Critical dimension metrology, Tolerancing, Lithography, Photomasks, Scanners, Semiconducting wafers, Electroluminescence, Optical lithography, Error analysis, Reactive ion etching

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Proceedings Article | 26 March 2007 Paper

Topography induced defocus with a scanning exposure system

Bernhard Liegl, Nelson Felix, Colin Brodsky, David Dobuzinsky

Proceedings Volume 6520, 65203J (2007) https://doi.org/10.1117/12.712420

KEYWORDS: Semiconducting wafers, Metrology, Wafer testing, Image processing, Imaging systems, Optical lithography, Pulsed laser operation, Spatial resolution, Microelectronics, Chemical engineering

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Proceedings Article | 29 March 2006 Paper

Silicon containing polymer in applications for 193-nm high-NA lithography processes

Sean Burns, Dirk Pfeiffer, Arpan Mahorowala, Karen Petrillo, Alexandera Clancy, Katherina Babich, David Medeiros, Scott Allen, Steven Holmes, Michael Crouse, Colin Brodsky, Victor Pham, Yi-Hsiung Lin, Kaushal Patel, Naftali Lustig, Allen Gabor, Christopher Sheraw, Phillip Brock, Carl Larson

Proceedings Volume 6153, 61530K (2006) https://doi.org/10.1117/12.657197

KEYWORDS: Silicon, Reflectivity, Etching, Photoresist materials, Polymers, Lithography, Oxides, Silicon films, Reactive ion etching, Optical lithography

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Proceedings Article | 21 March 2006 Paper

Lithography budget analysis at the process module level

Colin Brodsky, William Chu

Proceedings Volume 6154, 61543Y (2006) https://doi.org/10.1117/12.659458

KEYWORDS: Photomasks, Critical dimension metrology, Reactive ion etching, Lithography, Semiconducting wafers, Optical lithography, Optical proximity correction, Error analysis, Scanners, Etching

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Proceedings Article | 10 May 2005 Paper

Exploring advanced mask repair options

Emily Fisch, Colin Brodsky, Philip Flanigan, Mark Lawliss, Jed Rankin, David Thibault

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600101

KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Carbon, SRAF, Scanning electron microscopy, Opacity, Resolution enhancement technologies, Manufacturing, Modulation

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Proceedings Article | 14 May 2004 Paper

Rinse additives for defect suppression in 193-nm and 248-nm lithogrophy

Spyridon Skordas, Ryan Burns, Dario Goldfarb, Sean Burns, Marie Angelopoulos, Colin Brodsky, Margaret Lawson, Carole Pillette, Jeffrey Bright, Robert Isaacson, Mark Lagus, Vandana Vishnu

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.537764

KEYWORDS: Adsorption, Lithography, Semiconducting wafers, Polymers, Photoresist processing, Satellites, Molecules, Particles, Photoresist developing, 193nm lithography

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Proceedings Article | 14 May 2004 Paper

Rinse additives for line-edge roughness control in 193-nm lithography

Dario Goldfarb, Sean Burns, Ryan Burns, Colin Brodsky, Margaret Lawson, Marie Angelopoulos

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.537723

KEYWORDS: Line edge roughness, Critical dimension metrology, Lithography, Semiconducting wafers, Extreme ultraviolet lithography, Photoresist materials, Photoresist developing, Photoresist processing, Standards development, Optical lithography

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Proceedings Article | 16 June 2003 Paper

Cationic graft polymerization lithography

Heather Johnson, Sahban Ozair, Andrew Jamieson, Brian Trinque, Colin Brodsky, C. Grant Willson

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484974

KEYWORDS: Polymers, Lithography, Polymerization, Etching, Silicon, Crystals, Polymer thin films, Quartz, Imaging systems, Oxygen

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Proceedings Article | 12 June 2003 Paper

Highly etch-selective spin-on bottom antireflective coating for use in 193-nm lithography and beyond

Dirk Pfeiffer, Arpan Mahorowala, Katherina Babich, David Medeiros, Karen Petrillo, Marie Angelopoulos, Wu-Song Huang, Scott Halle, Colin Brodsky, Scott Allen, Steven Holmes, Ranee Kwong, Robert Lang, Phillip Brock

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485178

KEYWORDS: Silicon, Etching, Lithography, Polymers, Oxides, Photoresist processing, Reflectivity, Silicon films, 193nm lithography, Bottom antireflective coatings

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Proceedings Article | 16 July 2002 Paper

Novel polychromatic measurement technique for determining the dissolution rate of very thin resist films

Stewart Robertson, Doris Kang, Steven Scheer, Colin Brodsky

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473460

KEYWORDS: Thin films, Reflectivity, Silicon films, Reflection, Signal attenuation, Silicon, Photoresist developing, Optical testing, Silica, Inspection

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Proceedings Article | 16 July 2002 Paper

Design of a cost-effective multiwavelength development rate monitoring tool

Steven Scheer, Colin Brodsky, Stewart Robertson, Doris Kang

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473422

KEYWORDS: Photoresist developing, Reflectivity, Semiconducting wafers, Photoresist materials, Polymers, Algorithm development, Thin films, Data modeling, Interfaces, Reflection

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Proceedings Article | 14 September 2001 Paper

Theoretical and experimental optimization of numerical aperture and partial coherence for complementary phase-shift processes

Colin Brodsky, Carla Nelson-Thomas, Nigel Cave, John Sturtevant

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435774

KEYWORDS: Photomasks, Binary data, Phase shifts, Lithographic illumination, Tolerancing, Lithography, Deep ultraviolet, Photoresist processing, Image quality, Coherence (optics)

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Proceedings Article | 24 August 2001 Paper

Resist rehydration during thick film processing

Octavia Lehar, Mark Spak, Stephen Meyer, Ralph Dammel, Colin Brodsky, C. Grant Willson

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436878

KEYWORDS: Semiconducting wafers, Diffusion, Photoresist materials, Quartz, Humidity, Crystals, Absorption, Lithography, Thin films, Spectroscopy

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Proceedings Article | 20 August 2001 Paper

Advances in graft polymerization lithography

Colin Brodsky, Brian Trinque, Heather Johnson, C. Grant Willson

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436660

KEYWORDS: Polymers, Polymerization, Silicon, Oxides, Lithography, Deposition processes, Liquids, Chemistry, Photoresist processing, Image processing

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Proceedings Article | 23 June 2000 Paper

Polymers for 157-nm photoresist applications: a progress report

Kyle Patterson, Mikio Yamachika, Raymond Hung, Colin Brodsky, Shintaro Yamada, Mark Somervell, Brian Osborn, Daniel Hall, Gordana Dukovic, Jeff Byers, Will Conley, C. Grant Willson

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388320

KEYWORDS: Photoresist materials, Polymers, Absorbance, Photoresist developing, Transparency, Deep ultraviolet, Etching, Vacuum ultraviolet, Resistance, Fluorine

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Showing 5 of 19 publications

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