Gerardo Bottiglieri
Senior Design Engineer
SPIE Involvement:
Conference Program Committee | Author
Publications (24)

SPIE Journal Paper | 8 October 2024 Open Access
JM3, Vol. 24, Issue 01, 011002, (October 2024) https://doi.org/10.1117/12.10.1117/1.JMM.24.1.011002
KEYWORDS: Photomasks, Light sources and illumination, Surface plasmons, Semiconducting wafers, Resolution enhancement technologies, Source mask optimization, Nanoimprint lithography, Near field, Diffraction, Lithography

Proceedings Article | 18 September 2024 Paper
Proceedings Volume 13273, 1327306 (2024) https://doi.org/10.1117/12.3027067
KEYWORDS: Particles, Scanners, Semiconducting wafers, Simulations, Extreme ultraviolet, Tolerancing, Extreme ultraviolet lithography, Printing, Particle contamination, Defect inspection, Mask cleaning, Computational imaging

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12953, 1295302 (2024) https://doi.org/10.1117/12.3009996
KEYWORDS: Photomasks, Light sources and illumination, Source mask optimization, Lithography, Near field, Diffraction

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12051, PC1205108 (2022) https://doi.org/10.1117/12.2614174
KEYWORDS: Extreme ultraviolet, Refractive index, Nanoimprint lithography, High volume manufacturing, Extreme ultraviolet lithography, Diffraction, 3D printing, 3D image processing

Proceedings Article | 29 September 2021 Presentation
Proceedings Volume 11854, 118540U (2021) https://doi.org/10.1117/12.2601243
KEYWORDS: Photomasks, Extreme ultraviolet, Diffraction, Refractive index, Systems modeling, Reflectivity, Phase shifts, Mirrors, Lithographic illumination, Extreme ultraviolet lithography

Proceedings Article | 28 September 2021 Presentation
Proceedings Volume 11854, 118540G (2021) https://doi.org/10.1117/12.2600965
KEYWORDS: Imaging systems, Extreme ultraviolet, Fiber optic illuminators, Transistors, Scanners, Optimization (mathematics), Mirrors, Metals, Extreme ultraviolet lithography

SPIE Journal Paper | 20 May 2021 Open Access
JM3, Vol. 20, Issue 02, 021004, (May 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.2.021004
KEYWORDS: Extreme ultraviolet, Photomasks, Waveguides, Refractive index, Waveguide modes, Diffraction, Wave propagation, Near field, Nanoimprint lithography, Extreme ultraviolet lithography

Proceedings Article | 22 February 2021 Presentation
Proceedings Volume 11609, 116090E (2021) https://doi.org/10.1117/12.2587948
KEYWORDS: Extreme ultraviolet, Photomasks, Waveguides, Refractive index, Waveguide modes, Near field, Nanoimprint lithography, SRAF, Coherence imaging, Binary data

Proceedings Article | 22 February 2021 Presentation + Paper
Timothy Brunner, Jara Santaclara, Gerardo Bottiglieri, Chris Anderson, Patrick Naulleau
Proceedings Volume 11609, 1160906 (2021) https://doi.org/10.1117/12.2582751

Proceedings Article | 18 December 2020 Presentation + Paper
Proceedings Volume 11517, 115170Y (2020) https://doi.org/10.1117/12.2574450
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Reflectivity, EUV optics, Ion beams, Manufacturing

Proceedings Article | 16 October 2020 Presentation + Paper
Natalia Davydova, Fei Liu, Markus Benk, Eelco van Setten, Gerardo Bottiglieri, Anton van Oosten, John McNamara, Vincent Wiaux, Joern-Holger Franke, Kenneth Goldberg, DS Nam, Joseph Zekry, Patrick Naulleau, Timon Fliervoet, Rene Carpaij
Proceedings Volume 11517, 1151714 (2020) https://doi.org/10.1117/12.2572846
KEYWORDS: Scanners, Photomasks, Extreme ultraviolet lithography, Optical lithography, Reticles, Extreme ultraviolet, Microscopes, Light sources, Fiber optic illuminators, Projection systems

Proceedings Article | 23 March 2020 Presentation + Paper
Proceedings Volume 11323, 1132316 (2020) https://doi.org/10.1117/12.2551870
KEYWORDS: Reflectivity, Multilayers, Photomasks, Extreme ultraviolet, Silicon, Molybdenum, Diffraction, Optimization (mathematics), Lithography, Optical lithography

Proceedings Article | 9 October 2019 Presentation + Paper
Proceedings Volume 11147, 111470S (2019) https://doi.org/10.1117/12.2537103
KEYWORDS: Particles, Line width roughness, Pellicles, Semiconducting wafers, Extreme ultraviolet, Reticles, Scanners, Extreme ultraviolet lithography, Photomasks

Proceedings Article | 29 August 2019 Paper
Proceedings Volume 11177, 111770V (2019) https://doi.org/10.1117/12.2534177
KEYWORDS: Particles, Pellicles, Photomasks, Phase shifts, Extreme ultraviolet, Scanners, Nanoimprint lithography, Extreme ultraviolet lithography, Reticles

Proceedings Article | 29 August 2019 Paper
Proceedings Volume 11177, 111770I (2019) https://doi.org/10.1117/12.2536329
KEYWORDS: Lithography, Extreme ultraviolet, Projection systems, Diffraction, Extreme ultraviolet lithography, Scanners, EUV optics, Lithographic illumination, Projection lithography, Optical imaging, Computational lithography

Proceedings Article | 26 March 2019 Presentation + Paper
Proceedings Volume 10957, 1095709 (2019) https://doi.org/10.1117/12.2514952
KEYWORDS: Source mask optimization, Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Photomasks, Diffraction

Proceedings Article | 26 March 2019 Presentation + Paper
Proceedings Volume 10957, 109570Z (2019) https://doi.org/10.1117/12.2515678
KEYWORDS: Diffraction, Photomasks, Extreme ultraviolet, 3D modeling, 3D image processing, Lithography, Projection systems

Proceedings Article | 12 October 2018 Presentation
Proceedings Volume 10809, 1080910 (2018) https://doi.org/10.1117/12.2502149
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Fiber optic illuminators, Transistors, Photomasks, Mirrors, Image resolution

Proceedings Article | 29 May 2018 Paper
Proceedings Volume 10694, 106940H (2018) https://doi.org/10.1117/12.2315091
KEYWORDS: Photomasks, Nanoimprint lithography, Diffraction, Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Lithographic illumination, Imaging systems, Reflectivity, Critical dimension metrology

Proceedings Article | 30 October 2017 Presentation + Paper
Proceedings Volume 10450, 104500W (2017) https://doi.org/10.1117/12.2280624
KEYWORDS: Extreme ultraviolet lithography, Nanoimprint lithography, Photomasks, Extreme ultraviolet, Reflectivity, Scanners, Mirrors, Semiconducting wafers, Reticles, Imaging systems

Proceedings Article | 20 October 2016 Paper
Proceedings Volume 10032, 100320B (2016) https://doi.org/10.1117/12.2250630
KEYWORDS: Photomasks, Extreme ultraviolet, Lithography, Extreme ultraviolet lithography, Nanoimprint lithography, Semiconducting wafers, Reticles, Reflectivity, Scanners, Image quality

Proceedings Article | 18 March 2016 Paper
Proceedings Volume 9776, 97761I (2016) https://doi.org/10.1117/12.2220150
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Reticles, Scanners, Semiconducting wafers, Source mask optimization, Wafer-level optics, Lithography, Imaging systems, Extreme ultraviolet, Neodymium, Ions

Proceedings Article | 16 November 2015 Paper
Proceedings Volume 9635, 963503 (2015) https://doi.org/10.1117/12.2202258
KEYWORDS: Extreme ultraviolet lithography, Scanners, Photomasks, Reticles, Image resolution, Lithography, Wafer-level optics, Semiconducting wafers, Source mask optimization, EUV optics, Imaging systems, Nanoimprint lithography, Ions, Neodymium

Proceedings Article | 4 September 2015 Paper
Proceedings Volume 9661, 96610S (2015) https://doi.org/10.1117/12.2195476
KEYWORDS: Photomasks, Imaging systems, Extreme ultraviolet, Nanoimprint lithography, Reticles, Semiconducting wafers, Electroluminescence, Ions, Nickel, Logic

Showing 5 of 24 publications
Conference Committee Involvement (2)
40th European Mask and Lithography Conference (EMLC 2025)
16 June 2025 | Dresden, Germany
Computational Optics 2024
10 April 2024 | Strasbourg, France
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top