Mr. Martin Niehoff Profile

Martin Niehoff

Application Engineer at Siemens EDA

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Author

Publications (13)

Proceedings Article | 28 April 2023 Paper

Design-aware virtual metrology and process recipe recommendation

Nathan Greeneltch, Haizhou Yin, J. Andres Torres, Melody Tao, Steven Lubin, Srividya Jayaram, Ivan Kissiov, Martin Niehoff, Marcus Wolf, Paul Jungmann, Todd Bailey

Proceedings Volume 12495, 124951V (2023) https://doi.org/10.1117/12.2661150

KEYWORDS: Data modeling, Semiconducting wafers, Metrology, Modeling, Machine learning, Fabrication, Data processing, Semiconductors, Process modeling, Deposition processes

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Proceedings Article | 23 March 2011 Paper

Simulation-based scanner tuning using FlexRay capability and scatterometry

Karsten Bubke, Matthias Ruhm, Rafael Aldana, Martin Niehoff, Xu Xie, Justin Ghan, Paul van Adrichem, Holger Bald, Paul Luehrmann, Stefan Roling, Rolf Seltmann

Proceedings Volume 7973, 79732E (2011) https://doi.org/10.1117/12.890501

KEYWORDS: Data modeling, Scanners, Scatterometry, Scanning electron microscopy, Metrology, Critical dimension metrology, Semiconducting wafers, Printing, Imaging systems, Cadmium

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Proceedings Article | 4 March 2010 Paper

Selective inverse lithography methodology

ChinTeong Lim, Vlad Temchenko, Martin Niehoff

Proceedings Volume 7640, 764034 (2010) https://doi.org/10.1117/12.845464

KEYWORDS: Optical proximity correction, Photomasks, Lithography, Photovoltaics, Inspection, Manufacturing, Logic, 193nm lithography, Optical lithography, Reticles

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Proceedings Article | 16 March 2009 Paper

Manufacturability of ILT patterns in low-NA 193nm environment

ChinTeong Lim, Vlad Temchenko, Ingo Meusel, Dieter Kaiser, Jens Schneider, Martin Niehoff

Proceedings Volume 7274, 727439 (2009) https://doi.org/10.1117/12.814144

KEYWORDS: Photomasks, Optical proximity correction, Lithography, Resolution enhancement technologies, Manufacturing, Lithographic illumination, Semiconducting wafers, Logic, 193nm lithography, Silicon

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Proceedings Article | 2 May 2008 Paper

Optical proximity correction for 0.13 um SiGe:C BiCMOS

S. Geisler, J. Bauer, U. Haak, U. Jagdhold, R. Pliquett, E. Matthus, R. Schrader, H. Wolf, U. Baetz, H. Beyer, M. Niehoff

Proceedings Volume 6792, 679210 (2008) https://doi.org/10.1117/12.798786

KEYWORDS: Optical proximity correction, Photomasks, Scanning electron microscopy, Metals, Transistors, Distortion, Critical dimension metrology, Etching, Lithography, Line edge roughness

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Proceedings Article | 1 April 2008 Paper

Coupled-dipole modelling for 3D mask simulation

Vlad Temchenko, Chinteong Lim, Dave Wallis, Jens Schneider, Martin Niehoff

Proceedings Volume 6924, 69240W (2008) https://doi.org/10.1117/12.772572

KEYWORDS: Photomasks, Finite-difference time-domain method, Near field, Optical proximity correction, Polarization, Interfaces, 3D modeling, Lithography, Computer simulations, Semiconducting wafers

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Proceedings Article | 7 March 2008 Paper

Consideration of VT5 etch-based OPC modeling

ChinTeong Lim, Vlad Temchenko, Dieter Kaiser, Ingo Meusel, Sebastian Schmidt, Jens Schneider, Martin Niehoff

Proceedings Volume 6924, 69243D (2008) https://doi.org/10.1117/12.772585

KEYWORDS: Etching, Optical proximity correction, Data modeling, Process modeling, Calibration, Optics manufacturing, Critical dimension metrology, Lithography, Photoresist processing, Design for manufacturing

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Proceedings Article | 30 October 2007 Paper

Etch proximity correction by integrated model-based retargeting and OPC flow

Shumay Shang, Yuri Granik, Martin Niehoff

Proceedings Volume 6730, 67302G (2007) https://doi.org/10.1117/12.746773

KEYWORDS: Etching, Optical proximity correction, Model-based design, Integrated modeling, Calibration, Optical calibration, Visibility, Photomasks, Visualization, Photoresist processing

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Proceedings Article | 28 March 2007 Paper

Modular process modeling for OPC

M. Keck, C. Bodendorf, T. Schmidtling, R. Schlief, R. Wildfeuer, S. Zumpe, M. Niehoff

Proceedings Volume 6520, 652044 (2007) https://doi.org/10.1117/12.716295

KEYWORDS: Optical proximity correction, Process modeling, Data modeling, Photoresist processing, Etching, Error analysis, Scanning electron microscopy, 3D modeling, Wafer-level optics, Statistical modeling

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Proceedings Article | 27 March 2007 Paper

Investigation of DFM-lite ORC approach during OPC simulation

Chin Teong Lim, Kai Peter, Vlad Temchenko, Dave Wallis, Dieter Kaiser, Ingo Meusel, Sebastian Schmidt, Martin Niehoff

Proceedings Volume 6520, 65204E (2007) https://doi.org/10.1117/12.711395

KEYWORDS: Optical proximity correction, Polishing, Design for manufacturing, Image processing, Lithography, Computer simulations, Optics manufacturing, Photomasks, Design for manufacturability, Image quality

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Proceedings Article | 16 March 2006 Paper

The influence of calibration pattern coverage for lumped parameter resist models on OPC convergence

Martin Niehoff, Shumay Shang, Olivier Toublan

Proceedings Volume 6156, 615619 (2006) https://doi.org/10.1117/12.657536

KEYWORDS: Calibration, Optical proximity correction, Data modeling, Visualization, Printing, Optical simulations, Feature extraction, Process modeling, Metals, Scanning electron microscopy

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Proceedings Article | 14 March 2006 Paper

Impact of process variation on 65nm across-chip linewidth variation

Le Hong, Travis Brist, Pat LaCour, John Sturtevant, Martin Niehoff, Philipp Niedermaier

Proceedings Volume 6156, 61560Q (2006) https://doi.org/10.1117/12.660541

KEYWORDS: Critical dimension metrology, Optical proximity correction, Manufacturing, Tolerancing, Lithography, Printing, Photomasks, Resolution enhancement technologies, Semiconducting wafers, Silicon

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Proceedings Article | 10 March 2006 Paper

Process influence study on optical model generation during model-based OPC development

ChinTeong Lim, Vlad Temchenko, Woong-Jae Chung, Dave Wallis, Robert Wildfeuer, Uta Mierau, Sebastian Schmidt, Martin Niehoff

Proceedings Volume 6155, 615503 (2006) https://doi.org/10.1117/12.655801

KEYWORDS: Data modeling, Calibration, Photoresist processing, Optical proximity correction, Process modeling, Optical calibration, Diffusion, Coherence (optics), Statistical modeling, Model-based design

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Showing 5 of 13 publications

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