Ms. Ling Ee Tan Profile

Ling Ee Tan

Senior Engineer 2

SPIE Involvement:

Author

Publications (18)

Proceedings Article | 28 April 2023 Poster + Paper

Poster + Paper

EUV SRAFs printing modeling and verification in 2D hole array

Azat Latypov, Satya Sriram, Prakash Deep, Farruh Shahidi, Shuling Wang, Shumay Shang, Germain Fenger, Werner Gillijns, Chih-I Wei, Ling Ee Tan, Le Hong, Lianghoon Yin

Proceedings Volume 12494, 1249417 (2023) https://doi.org/10.1117/12.2658320

KEYWORDS: SRAF, Printing, Stochastic processes, Modeling, Semiconducting wafers, Scanning electron microscopy, Extreme ultraviolet, Design and modelling, Data modeling, Photomasks

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Proceedings Article | 28 April 2023 Presentation + Paper

Presentation + Paper

Feasibility of logic metal scaling with 0.55NA EUV single patterning

Dongbo Xu, Ling Ee Tan, Vicky Philipsen, Werner Gillijns, Joerg Zimmermann

Proceedings Volume 12494, 124940M (2023) https://doi.org/10.1117/12.2657983

KEYWORDS: Source mask optimization, Metals, Extreme ultraviolet lithography, SRAF, Logic, Photomasks, Printing, Extreme ultraviolet

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Proceedings Article | 28 April 2023 Paper

Paper

EUV single patterning of random logic via using bright field mask

Werner Gillijns, Dongbo Xu, Jae Uk Lee, Jeroen van de Kerkhove, Vicky Philipsen, Ryoung-han Kim, Ling Ee Tan

Proceedings Volume 12494, 124940X (2023) https://doi.org/10.1117/12.2658344

KEYWORDS: Source mask optimization, Reticles, Resolution enhancement technologies, Extreme ultraviolet lithography, SRAF, Logic, Semiconducting wafers, Design and modelling, Critical dimension metrology, Optical proximity correction, Printing

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SPIE Journal Paper | 25 November 2022

Extend 0.33 NA extreme ultraviolet single patterning to pitch 28-nm metal design by low-n mask

Dongbo Xu, Werner Gillijns, Ling Ee Tan, David Rio, Max Delorme, Vicky Philipsen, Ryoung-han Kim

JM3, Vol. 21, Issue 04, 043202, (November 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.4.043202

KEYWORDS: Photomasks, Design and modelling, Optical lithography, Metals, Binary data, SRAF, Critical dimension metrology, Extreme ultraviolet, Printing, Logic

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Proceedings Article | 15 September 2022 Presentation

Presentation

The EUV mask exposed

Jetske Stortelder, Mike Cooke, Andy Goodyear, Victor Soltwisch, Qais Saadeh, Sascha Brose, Andreas Erdmann, Vicky Philipsen, Devesh Thakare, Dongbo Xu, Ling Ee Tan

Proceedings Volume PC12325, PC123250B (2022) https://doi.org/10.1117/12.2641306

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Proceedings Article | 26 May 2022 Presentation + Paper

Presentation + Paper

Investigation of low-n mask in 0.33 NA EUV single patterning at pitch 28nm metal design

Dongbo Xu, Ling Ee Tan, Vicky Philipsen, Ryoung-Han Kim, Werner Gillijns

Proceedings Volume 12051, 120510H (2022) https://doi.org/10.1117/12.2614197

KEYWORDS: Photomasks, SRAF, Nanoimprint lithography, Metals, Extreme ultraviolet

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Proceedings Article | 26 May 2022 Poster + Paper

Poster + Paper

EUV low-n attenuated phase-shift mask on random logic via single patterning at pitch 36nm

Ling Ee Tan, Werner Gillijns, Jae Uk Lee, Dongbo Xu, Jeroen van de Kerkhove, Ryoung-Han Kim, Vicky Philipsen

Proceedings Volume 12051, 120510P (2022) https://doi.org/10.1117/12.2614000

KEYWORDS: Photomasks, Optical proximity correction, SRAF, Logic, Nanoimprint lithography, Source mask optimization, Photovoltaics, Printing, Lens design, Semiconducting wafers

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SPIE Journal Paper | 7 April 2022

Exploration of alternative mask for 0.33NA extreme ultraviolet single patterning at pitch 28-nm metal design

Dongbo Xu, Werner Gillijns, Ling Ee Tan, Vicky Philipsen, Ryoung-Han Kim

JM3, Vol. 21, Issue 02, 024401, (April 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.2.024401

KEYWORDS: Photomasks, SRAF, Optical lithography, Nanoimprint lithography, Extreme ultraviolet, Molybdenum, Binary data, Metals, Source mask optimization, Personal protective equipment

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Proceedings Article | 12 October 2021 Presentation + Paper

Presentation + Paper

Exploration of alternative mask for 0.33NA EUV single patterning at pitch 28nm

Vicky Philipsen, Ling Ee Tan, Dongbo Xu, Werner Gillijns, Ryoung-han Kim

Proceedings Volume 11854, 118540T (2021) https://doi.org/10.1117/12.2599054

KEYWORDS: SRAF, Photomasks, Optical lithography, Source mask optimization, Extreme ultraviolet, Logic

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Proceedings Article | 22 February 2021 Presentation + Paper

Presentation + Paper

EUV single patterning exploration for pitch 28 nm

Dongbo Xu, Werner Gillijns, Ling Ee Tan, Apoorva Oak, Ryoung-han Kim, Youssef Drissi

Proceedings Volume 11614, 116140Q (2021) https://doi.org/10.1117/12.2584730

KEYWORDS: Optical proximity correction, Semiconducting wafers, Metals, Extreme ultraviolet, SRAF, Lithography

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Proceedings Article | 25 March 2020 Presentation

Presentation

Concurrent design rule, OPC and process optimization in EUV Lithography (Conference Presentation)

Werner Gillijns, Ling Ee Tan, Jae Uk Lee, Ryoung-Han Kim, Dongbo Xu

Proceedings Volume 11328, 1132804 (2020) https://doi.org/10.1117/12.2553212

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Proceedings Article | 4 April 2019 Paper

Paper

EUV computational lithography using accelerated topographic mask simulation

Vitaly Domnenko, Bernd Küchler, Wolfgang Hoppe, Jürgen Preuninger, Ulrich Klostermann, Wolfgang Demmerle, Martin Bohn, Dietmar Krüger, Ryoung Ryoung Han Kim, Ling Ee Tan

Proceedings Volume 10962, 109620O (2019) https://doi.org/10.1117/12.2515668

KEYWORDS: Photomasks, Extreme ultraviolet, Lithography, Computational lithography, 3D modeling, Computer simulations, Optical proximity correction, Performance modeling, Photoresist processing, Resolution enhancement technologies

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Proceedings Article | 21 March 2018 Presentation + Paper

Presentation + Paper

Single exposure EUV of 32nm pitch logic structures: patterning performance on BF and DF masks

V. Blanco Carballo, J. Bekaert, M. Mao, R. H. Kim, W. Gillijns, G. McIntyre, S. Biesemans, K. Nafus, M. Dusa, E. De Poortere, G. Schiffelers, M. Kupers, J. H. Franke, E. Hendrickx, Y. Drissi, D. Rio, M. Demand, L. E. Tan, J. Jia, S. Hsu

Proceedings Volume 10583, 105830L (2018) https://doi.org/10.1117/12.2299639

KEYWORDS: Etching, Tin, SRAF, Optical lithography, Logic, Extreme ultraviolet, Photomasks, Stochastic processes, Scanning electron microscopy, Photoresist processing

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Proceedings Article | 20 March 2018 Presentation + Paper

Presentation + Paper

IMEC N7, N5 and beyond: DTCO, STCO and EUV insertion strategy to maintain affordable scaling trend

Ryoung-han Kim, Yasser Sherazi, Peter Debacker, Praveen Raghavan, Julien Ryckaert, Arindam Malik, Diederik Verkest, Jae Uk Lee, Werner Gillijns, Ling Ee Tan, Victor Blanco, Kurt Ronse, Greg McIntyre

Proceedings Volume 10588, 105880N (2018) https://doi.org/10.1117/12.2299335

KEYWORDS: Optical lithography, Extreme ultraviolet, Metals, Logic, Manufacturing, Lithography, Back end of line, Extreme ultraviolet lithography, New and emerging technologies

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Proceedings Article | 16 October 2017 Presentation

Presentation

EUV single patterning for logic metal layers: achievement and challenge (Conference Presentation)

Victor Blanco Carballo, Stephane Larivière, Rudi De Ruyter, Morin Dehan, Gregory McIntyre, Ryoung-Han Kim, Werner Gillijns, Ling Ee Tan, Youssef Drissi, Jae Uk Lee, Darko Trivkovic

Proceedings Volume 10450, 1045004 (2017) https://doi.org/10.1117/12.2281738

KEYWORDS: Photomasks, Extreme ultraviolet, Optical lithography, Logic, Optical proximity correction, SRAF, Data conversion, Metals, Manufacturing, Semiconducting wafers

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Proceedings Article | 26 April 2017 Presentation + Paper

Presentation + Paper

Design and pitch scaling for affordable node transition and EUV insertion scenario

Ryoung-han Kim, Julien Ryckaert, Praveen Raghavan, Yasser Sherazi, Darko Trivkovic, Werner Gillijns, Ling Ee Tan, Youssef Drissi, Victor Blanco, Joost Bekaert, Ming Mao, Stephane Larivière, Greg McIntyre, Peter Debacker

Proceedings Volume 10148, 101480V (2017) https://doi.org/10.1117/12.2257885

KEYWORDS: Photomasks, Logic, Etching, SRAF, Extreme ultraviolet, Optical lithography, Metals, Computational lithography, Optical proximity correction, Semiconductor manufacturing

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Proceedings Article | 24 March 2017 Presentation + Paper

Presentation + Paper

Single exposure EUV patterning of BEOL metal layers on the IMEC iN7 platform

S. Paolillo, A. Mallik, V. Blanco Carballo, J. Bekaert, M. Mao, B. Kutrzeba Kotowska, S. Larivière, I. Ciofi, R. H. Kim, E. Hendrickx, E. Gallagher, L. E. Tan, W. Gillijns, D. Trivkovic, S. Halder, M. Gallagher, G. McIntyre, F. Lazzarino, M. Dusa, P. Rusu, F. Wittebrood, R. Baert, P. Leray, D. Wan, Y. Sherazi, T. Fliervoet, T. Hollink

Proceedings Volume 10143, 1014318 (2017) https://doi.org/10.1117/12.2258005

KEYWORDS: Metals, Extreme ultraviolet lithography, Optical lithography, Back end of line, Extreme ultraviolet, Etching, Semiconducting wafers, Logic, Critical dimension metrology, Tin

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Proceedings Article | 24 March 2017 Presentation + Paper

Presentation + Paper

Reticle enhancement techniques toward iN7 metal2

D. Trivkovic, W. Gillijns, L. E. Tan, V. Blanco, R. H. Kim, G. McIntyre, Y. Drissi, E. Gallagher

Proceedings Volume 10143, 1014314 (2017) https://doi.org/10.1117/12.2258003

KEYWORDS: Metals, Extreme ultraviolet, Optical proximity correction, Extreme ultraviolet lithography, Reticles, Optical lithography, Calibration, Source mask optimization, Photomasks, SRAF, Semiconducting wafers

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Showing 5 of 18 publications

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