Dr. Yusin Yang Profile

Dr. Yusin Yang

Master at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (14)

Proceedings Article | 10 April 2024 Poster

Validation of high-throughput AFM for copper pad metrology in high volume manufacturing

Kyung Souk Yi, Min Hong, Jiyeon Kim, Eunpa Kim, Kwang Soo Kim, Kyong Wook Noh, Su-Young Lee, Myungjun Lee, Yusin Yang, Hokyun Chin, Arseniy Kalinin, Irene Battisti, Erik Simons, Seokhan Kim, ShihWei Yu, Nelda Antonovaité, Niranjan Saikumar, Rudolf Wilhelm, Hamed Sadeghian

Proceedings Volume 12955, 129552U (2024) https://doi.org/10.1117/12.3010488

KEYWORDS: Semiconducting wafers, High volume manufacturing, Metrology, Copper, Chemical mechanical planarization, Surface finishing, Semiconductor manufacturing, Process control, Miniaturization, Atomic force microscopy

Proceedings Article | 10 April 2024 Presentation + Paper

Non-contact measurement of dopant depth profile with terahertz emission spectroscopy

Kenji Suzuki, Fumikazu Murakami, Inkeun Baek, Mitsunori Numata, Ingi Kim, Ryu Sungyoon, Shinji Ueyama, Yusin Yang, Masayoshi Tonouchi

Proceedings Volume 12955, 1295506 (2024) https://doi.org/10.1117/12.3010681

KEYWORDS: Terahertz radiation, Inspection, Dopants, Transmittance, Terahertz spectroscopy, Optical simulations, Emission spectroscopy, Statistical modeling, Silicon, Pulse signals

Read Abstract +

Proceedings Article | 10 April 2024 Presentation + Paper

E-beam simulation for advanced SEM applications in semiconductor industry

Wooyoung Cheon, Taejin Moon, In Kwon, Jinwoo Lee, Jaeyong Lee, Yongjae Kwon, Ashok Ramu, Seonghoon Jin, Tsuji Yukihide, Hyunwoo Chae, Chulwoo Park, Hyunsuk Choi, Kwangseok Lee, Byungseong Ahn, Jaehun Yang, Ami Ma, Qhwan Kim, Donghyeok Im, Jaehyun Bae, Jongcheon Sun, Su-Young Lee, Shinwook Yi, Jiseong Doh, Kyu Baik Chang, Songyi Han, Jaehoon Jeong, Yusin Yang, Dae Sin Kim

Proceedings Volume 12955, 129551J (2024) https://doi.org/10.1117/12.3010074

KEYWORDS: Monte Carlo methods, Scanning electron microscopy, TCAD, Scattering, Inspection, Semiconductors, Computer simulations, Physics, Critical dimension metrology

Read Abstract +

Proceedings Article | 5 June 2023 Presentation + Paper

Characterization of interface charge traps in PE-TEOS and HDP oxide with different annealing temperatures using time-dependent second-harmonic generation

Ingi Kim, Suhwan Park, Minhwan Seo, Sunhong Jun, Sungyoon Ryu, Sangwoo Bae, Namil Koo, Yusin Yang

Proceedings Volume 12569, 1256904 (2023) https://doi.org/10.1117/12.2657070

KEYWORDS: Oxides, Second harmonic generation, Interfaces, Annealing, Silicon, Electric fields, Electrical properties, Dielectrics, Silicon films, Wafer inspection

Read Abstract +

Proceedings Article | 27 April 2023 Presentation + Paper

Massive overlay metrology solution by realizing imaging Mueller matrix spectroscopic ellipsometry

Jaehyeon Son, Juntaek Oh, Eunsoo Hwang, Jinwoo Ahn, Jaewon Lee, Byungkwan Oh, Donggun Lee, Seunga Lim, Kihun Kang, Sangil Im, Jibin Jeong, Taehyun Yun, Jinsoo Lee, Changhyeong Yoon, Hyukjoon Cho, Gangbu Kim, Byeongki Kang, Hankyoul Moon, Jong-hyun Hwang, Youngkyu Park, Taejoong Kim, Suyoung Lee, Yusin Yang, Myungjun Lee

Proceedings Volume 12496, 124960L (2023) https://doi.org/10.1117/12.2657414

KEYWORDS: Overlay metrology, Mueller matrices, Semiconducting wafers, Spectroscopic ellipsometry, Critical dimension metrology, Imaging spectroscopy, Metrology, Polarization, Polysomnography, Image sensors

Read Abstract +

Proceedings Article | 27 April 2023 Paper

Wide-field massive CD metrology based on the imaging Mueller-matrix ellipsometry for semiconductor devices

Juntaek Oh, Jaehyeon Son, Eunsoo Hwang, Jinwoo Ahn, Jaewon Lee, Byungkwan Oh, Donggun Lee, Seunga Lim, Kihun Kang, Sangil Im, Jibin Jeong, Taehyun Yun, Jinsoo Lee, Changhyeong Yoon, Hyukjoon Cho, Gangbu Kim, Byeongki Kang, Hankyoul Moon, Jong-hyun Hwang, Youngkyu Park, Taejoong Kim, Suyoung Lee, Yusin Yang, Myungjun Lee

Proceedings Volume 12496, 124962X (2023) https://doi.org/10.1117/12.2658131

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Metrology, Semiconductors, Mueller matrices, Ellipsometry, Inspection

Read Abstract +

Proceedings Article | 27 April 2023 Presentation + Paper

Mueller matrix metrology with multi-angle information using multiple self-interference

Garam Choi, Jinyong Kim, Daehoon Han, Young-Uk Jin, Soonhong Hwang, Jinseob Kim, Wookrae Kim, Jaehwang Jung, Seungwoo Lee, Taejoong Kim, Jinwoo Ahn, Myungjun Lee, Gideok Kim, Su-Young Lee, Yusin Yang

Proceedings Volume 12496, 1249610 (2023) https://doi.org/10.1117/12.2657852

KEYWORDS: Mueller matrices, Line edge roughness, Polarization, Metrology, Simulations, Critical dimension metrology, Holograms, Ellipsometry, Holography

Read Abstract +

Proceedings Article | 27 April 2023 Presentation + Paper

A study on defect signal improvement using multi-scan optic patch images and new detection algorithm

Sungyoon Ryu, Seunghyeok Son, Chan-Gi Jeon, Sujin Lee, Minho Rim, Yusin Yang, Younghoon Sohn

Proceedings Volume 12496, 124960Y (2023) https://doi.org/10.1117/12.2657845

KEYWORDS: Signal to noise ratio, Defect detection, Inspection, Optical inspection, Semiconducting wafers, Signal detection, Semiconductors, Detection and tracking algorithms, Wafer-level optics, Reconstruction algorithms

Read Abstract +

Proceedings Article | 26 May 2022 Presentation + Paper

A study on the detection and monitoring of weak areas in wafer using massive 2D and 3D measurement data

Sungyoon Ryu, Dong Hoon Kim, Sunhong Jun, Suho Ryu, JaeHyung Ahn, Hyun Lee, Kwang-Eun Kim, Yusin Yang, Younghoon Sohn

Proceedings Volume 12053, 1205302 (2022) https://doi.org/10.1117/12.2613631

KEYWORDS: Semiconducting wafers, 3D metrology, Inspection, Metrology, Ellipsometry, 3D modeling, Detection and tracking algorithms, Wafer-level optics, Semiconductors, Manufacturing

Read Abstract +

Proceedings Article | 20 June 2021 Presentation + Paper

Angstrom-accuracy multilayer thickness determination using optical metrology and machine learning

Hyunsoo Kwak, Sungyoon Ryu, Suil Cho, Junmo Kim, Yusin Yang, Jungwon Kim

Proceedings Volume 11782, 117820U (2021) https://doi.org/10.1117/12.2592216

KEYWORDS: Machine learning, Data modeling, Transmission electron microscopy, Statistical modeling, Semiconductors, Optical metrology, 3D metrology, Target detection, Ultrafast phenomena, Spectroscopic ellipsometry

Read Abstract +

Proceedings Article | 13 March 2018 Presentation + Paper

Spectroscopic vector analysis for fast pattern quality monitoring

Younghoon Sohn, Sungyoon Ryu, Chihoon Lee, Yusin Yang

Proceedings Volume 10585, 105851J (2018) https://doi.org/10.1117/12.2296448

KEYWORDS: Critical dimension metrology, Phase shifts, Semiconductors, Spectroscopic ellipsometry, Scanning probe microscopy, Semiconducting wafers, Data modeling, Spectroscopes, Time metrology, Scanning electron microscopy

Read Abstract +

Proceedings Article | 28 March 2017 Presentation + Paper

A new method for wafer quality monitoring using semiconductor process big data

Younghoon Sohn, Hyun Lee, Yusin Yang, Chungsam Jun

Proceedings Volume 10145, 101450T (2017) https://doi.org/10.1117/12.2256435

KEYWORDS: Metrology, Data processing, Semiconductors, Failure analysis, Semiconducting wafers, Analytical research, Statistical analysis, Lithography, Wafer inspection, Data modeling, Algorithm development, Coating, Sensors

Read Abstract +

Proceedings Article | 9 September 2013 Paper

A study of the defect detection technology using the optic simulation for the semiconductor device

Yusin Yang, Yongdeok Jeong, Mitsunori Numata, Mira Park, Mingoo Seo, SangKil Lee, ChungSam Jun, Kyupil Lee, Insoo Cho

Proceedings Volume 8880, 88801S (2013) https://doi.org/10.1117/12.2025977

KEYWORDS: Polarization, Inspection, Wafer-level optics, Defect detection, Semiconducting wafers, Optical simulations, Finite-difference time-domain method, Optical inspection, Reflectivity, Semiconductors

Read Abstract +

Proceedings Article | 3 April 2012 Paper

A study of optical penetration into the micro-periodic structure of semiconductor devices

Harutaka Sekiya, Mitsuhiro Togashi, Mitsunori Numata, Yasutsugu Usami, Suejin Cho, Yongdeok Jeong, Yusin Yang

Proceedings Volume 8324, 83242T (2012) https://doi.org/10.1117/12.916267

KEYWORDS: Refractive index, Transmittance, Dielectrics, Defect detection, Semiconductors, Inspection, Mass attenuation coefficient, Finite-difference time-domain method, Electromagnetic radiation, Electronics

Read Abstract +

Showing 5 of 14 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years