Mr. James E. Vasek Profile

James E. Vasek

Manager at NXP Semiconductors

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Author

Publications (8)

Proceedings Article | 7 March 2008 Paper

SEM-contour based mask modeling

Jim Vasek, Edita Tejnil, Ir Kusnadi, Ofer Lindman, Ovadya Menadeva, Ram Peltinov

Proceedings Volume 6924, 69244Q (2008) https://doi.org/10.1117/12.776669

KEYWORDS: Photomasks, Calibration, Data modeling, Process modeling, Optical proximity correction, Scanning electron microscopy, Semiconducting wafers, Electron beam lithography, Lithography, Reticles

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Proceedings Article | 4 March 2008 Paper

Site portability and extrapolative accuracy of a predictive resist model

Jim Vasek, John Biafore, Stewart Robertson

Proceedings Volume 6925, 69251F (2008) https://doi.org/10.1117/12.772984

KEYWORDS: Calibration, Data modeling, Photoresist processing, Fourier transforms, Manufacturing, Optical proximity correction, Lithography, Photomasks, Fiber optic illuminators, Critical dimension metrology

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Proceedings Article | 12 April 2007 Paper

SEM-contour-based OPC model calibration through the process window

Jim Vasek, Ovadya Menedeva, Dan Levitzky, Ofer Lindman, Youval Nemadi, George Bailey, John Sturtevant

Proceedings Volume 6518, 65180D (2007) https://doi.org/10.1117/12.712232

KEYWORDS: Calibration, Optical proximity correction, Scanning electron microscopy, Process modeling, Data modeling, Databases, Metrology, Semiconducting wafers, Detection and tracking algorithms, Visualization

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Proceedings Article | 28 March 2007 Paper

Circuit-based SEM contour OPC model calibration

Kyle Patterson, Jim Vasek, Chi Min Yuan, George Bailey, Ir Kusnadi, Thuy Do, John Sturtevant

Proceedings Volume 6521, 65211N (2007) https://doi.org/10.1117/12.713044

KEYWORDS: Calibration, Optical proximity correction, Data modeling, Scanning electron microscopy, Model-based design, Critical dimension metrology, Process modeling, Manufacturing, Data processing, Metrology

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Proceedings Article | 20 October 2006 Paper

Phase-shift reticle design impact on patterned linewidth variation and LWR

Jim Vasek, Chong-Cheng Fu, Gong Chen

Proceedings Volume 6349, 63491S (2006) https://doi.org/10.1117/12.686594

KEYWORDS: Photomasks, Critical dimension metrology, Reticles, Manufacturing, Line width roughness, Semiconducting wafers, Optical proximity correction, Lithography, Optical lithography, Resolution enhancement technologies

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Proceedings Article | 14 March 2006 Paper

Using design intent to qualify and control lithography manufacturing

Jim Vasek, Bill Wilkinson, Al Reich, Cesar Garza, Joyce Zhao, Jim Wiley, Moshe Poyastro, Brian Troy, Youval Nehmadi, Zamir Abraham

Proceedings Volume 6156, 61561B (2006) https://doi.org/10.1117/12.656856

KEYWORDS: Lithography, Optical proximity correction, Scanning electron microscopy, Manufacturing, Semiconducting wafers, Electroluminescence, Critical dimension metrology, Control systems, Process control, Resolution enhancement technologies

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Proceedings Article | 26 June 2003 Paper

Process, design, and optical proximity correction requirements for the 65nm device generation

Kevin Lucas, Patrick Montgomery, Lloyd Litt, Will Conley, Sergei Postnikov, Wei Wu, Chi-Min Yuan, Marc Olivares, Kirk Strozewski, Russell Carter, James Vasek, David Smith, Eric Fanucchi, Vincent Wiaux, Geert Vandenberghe, Olivier Toublan, Arjan Verhappen, Jan Kuijten, Johannes van Wingerden, Bryan Kasprowicz, Jeffrey Tracy, Christopher Progler, Eugene Shiro, Igor Topouzov, Karl Wimmer, Bernard Roman

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485498

KEYWORDS: Reticles, Optical lithography, Optical proximity correction, Lithography, 193nm lithography, Scanners, Logic, Optical design, Lithographic illumination, SRAF

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Proceedings Article | 9 February 1993 Paper

Transition of optical sensors for aircraft from engineering to manufacture

Fernando Dones, James Vasek, Mike Terzic

Proceedings Volume 1799, (1993) https://doi.org/10.1117/12.141340

KEYWORDS: Sensors, Manufacturing, Optical sensors, Fiber optics sensors, Optics manufacturing, Electronics, Environmental sensing, Sensor technology, Interfaces, Transducers

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Showing 5 of 8 publications

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