Dr. Kirk J. Strozewski Profile

Dr. Kirk J. Strozewski

Principal Lithography Engineer at Synopsys Inc

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Publications (8)

Proceedings Article | 24 May 2004 Paper

Qualification of a low-cost high-quality reticle process for 90-nm contact layers

Kirk Strozewski, Joe Perez, Rusty Carter, Robert Kiefer, Curt Jackson, Susan MacDonald, Franklin Kalk

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.536712

KEYWORDS: Photomasks, Reticles, Deep ultraviolet, Semiconducting wafers, Electron beam lithography, Mask making, Optical lithography, Semiconductors, Lithography, Inspection

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Proceedings Article | 3 May 2004 Paper

Combining OPC and design for printability into 65-nm logic designs

Kevin Lucas, Chi-Min Yuan, Robert Boone, Kirk Strozewski, Jason Porter, Ruiqi Tian, Karl Wimmer, Jonathan Cobb, Bill Wilkinson, Olivier Toublan

Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.537655

KEYWORDS: Reticles, Optical proximity correction, Design for manufacturing, Lithography, Logic, Model-based design, Metals, Manufacturing, Optical lithography, Yield improvement

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Proceedings Article | 26 June 2003 Paper

Process, design, and optical proximity correction requirements for the 65nm device generation

Kevin Lucas, Patrick Montgomery, Lloyd Litt, Will Conley, Sergei Postnikov, Wei Wu, Chi-Min Yuan, Marc Olivares, Kirk Strozewski, Russell Carter, James Vasek, David Smith, Eric Fanucchi, Vincent Wiaux, Geert Vandenberghe, Olivier Toublan, Arjan Verhappen, Jan Kuijten, Johannes van Wingerden, Bryan Kasprowicz, Jeffrey Tracy, Christopher Progler, Eugene Shiro, Igor Topouzov, Karl Wimmer, Bernard Roman

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485498

KEYWORDS: Reticles, Optical lithography, Optical proximity correction, Lithography, 193nm lithography, Scanners, Logic, Optical design, Lithographic illumination, SRAF

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Proceedings Article | 26 June 2003 Paper

Optimization of the contact layer for 90-nm node lithography

Kirk Strozewski, Lena Zavyalova, Kevin Lucas

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485419

KEYWORDS: Nanoimprint lithography, Photomasks, Lithography, Phase shifts, Reticles, Lithographic illumination, Binary data, Optical proximity correction, Printing, Logic

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Proceedings Article | 12 June 2003 Paper

Photoresist reflow for 193-nm low-K1 lithography contacts

Patrick Montgomery, Kevin Lucas, Kirk Strozewski, Lena Zavyalova, Grozdan Grozev, Mario Reybrouck, Plamen Tzviatkov, Mireille Maenhoudt

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485186

KEYWORDS: Lithography, Semiconducting wafers, Etching, Optical lithography, Photoresist processing, Photomasks, Cadmium, Binary data, Polymers, 193nm lithography

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Proceedings Article | 2 June 2003 Paper

A new methodology to specify via and contact layer reticles for maximizing process latitude

Kirk Strozewski, Joe Perez, Anthony Vacca, Arthur Klaum, Keith Brankner

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.485024

KEYWORDS: Reticles, Inspection, Semiconducting wafers, Photomasks, Defect detection, Detection and tracking algorithms, Scanning electron microscopy, Wafer inspection, Optical lithography, Manufacturing

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Proceedings Article | 14 September 2001 Paper

Trench warfare!: fitting photons for fine-feature fabrication

Jan Kuijten, Will Conley, Robert Socha, Stephan van de Goor, Stephen Hsu, Dave Smith, Marc Oliveras, Kirk Strozenski

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435714

KEYWORDS: Optical proximity correction, Semiconducting wafers, Electroluminescence, Imaging systems, Lithography, Lithographic illumination, Reticles, Critical dimension metrology, Warfare, Photons

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Proceedings Article | 23 June 2000 Paper

Development of an i-line attenuated phase shift process for dual inlay interconnect lithography

John Sturtevant, Benjamin Ho, Vincent Geiszler, Matthew Herrick, Charles King, Russell Carter, Bernard Roman, Lloyd Litt, Brad Smith, Kirk Strozewski

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388335

KEYWORDS: Photomasks, Phase shifts, Metals, Lithography, Optical lithography, Deep ultraviolet, Photoresist materials, Binary data, Dielectrics, Copper

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Showing 5 of 8 publications

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