PROCEEDINGS VOLUME 9256
PHOTOMASK JAPAN 2014 | 15-16 APRIL 2014
Photomask and Next-Generation Lithography Mask Technology XXI
Editor(s): Kokoro Kato
Editor Affiliations +
IN THIS VOLUME

13 Sessions, 33 Papers, 0 Presentations, 0 Posters
FPD Masks  (1)
Metrology  (4)
EUVL Masks I  (3)
EUV  (4)
Repair  (1)
EDA and RET  (3)
PHOTOMASK JAPAN 2014
15-16 April 2014
Yokohama, Japan
Front Matter: Volume 9256
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 925601 (2014) https://doi.org/10.1117/12.2074854
Invited Session
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 925602 (2014) https://doi.org/10.1117/12.2072945
Inspection and Cleaning
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 925603 (2014) https://doi.org/10.1117/12.2069977
Davide Dattilo, Uwe Dietze
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 925604 (2014) https://doi.org/10.1117/12.2070808
Masaharu Nishiguchi, Kouichi Kanno, Katsuya Hayano, Hideyoshi Takamizawa, Kana Ohara, Donghwan Son, Vikram Tolani
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 925605 (2014) https://doi.org/10.1117/12.2070026
Writing Technologies
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 925606 (2014) https://doi.org/10.1117/12.2069731
Hidekazu Takekoshi, Takahito Nakayama, Kenichi Saito, Hiroyoshi Ando, Hideo Inoue, Noriaki Nakayamada, Takashi Kamikubo, Rieko Nishimura, Yoshinori Kojima, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 925607 (2014) https://doi.org/10.1117/12.2065230
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 925608 (2014) https://doi.org/10.1117/12.2069651
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 925609 (2014) https://doi.org/10.1117/12.2070827
Lithography Related Technologies
FPD Masks
Nozomu Izumi, Miwako Ando, Yoshiyuki Nagai, Nobuhiko Yabu
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 92560C (2014) https://doi.org/10.1117/12.2065219
Metrology
Hyung-Joo Lee, Won Joo Park, Seuk Hwan Choi, Dong Hoon Chung, Inkyun Shin, Byung-Gook Kim, Chan-Uk Jeon, Hiroshi Fukaya, Yoshiaki Ogiso, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 92560D (2014) https://doi.org/10.1117/12.2069368
Shunsuke Sato, Frank Laske, Shinji Kunitani, Tatsuhiko Kamibayashi, Akira Fuse, Naoki Takahashi, Klaus-Dieter Roeth, Slawomir Czerkas, Mehdi Daneshpanah, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 92560E (2014) https://doi.org/10.1117/12.2070399
M. Daneshpanah, F. Laske, M. Wagner, K.-D. Roeth, S. Czerkas, H. Yamaguchi, N. Fujii, S. Yoshikawa, K. Kanno, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 92560F (2014) https://doi.org/10.1117/12.2072074
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 92560G (2014) https://doi.org/10.1117/12.2064944
EUVL Masks I
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 92560H (2014) https://doi.org/10.1117/12.2067145
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 92560I (2014) https://doi.org/10.1117/12.2069991
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 92560J (2014) https://doi.org/10.1117/12.2070303
EUVL Masks II
Emily Gallagher, Alfred Wagner, Mark Lawliss, Gregory McIntyre, Kazunori Seki, Takeshi Isogawa, Steven Nash
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 92560K (2014) https://doi.org/10.1117/12.2070871
EUVL Masks III
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 92560L (2014) https://doi.org/10.1117/12.2070045
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 92560M (2014) https://doi.org/10.1117/12.2069723
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 92560N (2014) https://doi.org/10.1117/12.2070251
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 92560O (2014) https://doi.org/10.1117/12.2069197
Takeshi Yamane, Yongdae Kim, Noriaki Takagi, Tsuneo Terasawa, Tomohisa Ino, Tomohiro Suzuki, Hiroki Miyai, Kiwamu Takehisa, Haruhiko Kusunose
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 92560P (2014) https://doi.org/10.1117/12.2067566
EUV
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 92560Q (2014) https://doi.org/10.1117/12.2069404
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 92560R (2014) https://doi.org/10.1117/12.2069885
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 92560S (2014) https://doi.org/10.1117/12.2067965
Masahiro Hatakeyama, Takeshi Murakami, Kenji Terao, Kenji Watanabe, Yasushi Tohma, Tsuyoshi Amano, Ryoichi Hirano, Susumu Iida, Tsuneo Terasawa, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 92560T (2014) https://doi.org/10.1117/12.2069901
Repair
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 92560U (2014) https://doi.org/10.1117/12.2070019
EDA and RET
Norimasa Nagase, Kanji Takeuchi, Mitsuo Sakurai, Takahisa Itoh, Tomoyuki Okada
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 92560V (2014) https://doi.org/10.1117/12.2067112
Kwei-Tin Yeh, Chao-Yi Huang
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 92560W (2014) https://doi.org/10.1117/12.2065207
Alexander Tritchkov, Sergey Kobelkov, Sergei Rodin, Kyohei Sakajiri, Evgueni Egorov, Soung-Su Woo
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XXI, 92560X (2014) https://doi.org/10.1117/12.2068493
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