Mr. Larry S. Zurbrick Profile

Larry S. Zurbrick

Emeritus at Keysight Technologies

SPIE Involvement:

Conference Program Committee | Author

Publications (33)

Proceedings Article | 21 November 2023 Poster + Paper

Improving overlay performance through enhanced stage positioning accuracy

James Prince, Victor David, Diana Poullos, Larry Zurbrick

Proceedings Volume 12751, 127511G (2023) https://doi.org/10.1117/12.2687910

KEYWORDS: Interferometers, Laser interferometry, Laser frequency, Heterodyning, Reflectors, Phase measurement, Mirrors, Optical resolution, Metrology, Beam path

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Proceedings Article | 13 October 2023 Paper

Inspection strategies for 1x reticles

Larry Zurbrick, George Brooks

Proceedings Volume 12809, 128090N (2023) https://doi.org/10.1117/12.3011909

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Proceedings Article | 6 December 2004 Paper

Chromeless phase lithography reticle defect inspection challenges and solutions

Larry Zurbrick, Anthony Vacca, Byran Reese, Douglas Van Den Broeke, Stephen Hsu, Darren Taylor, Bryan Kasprowicz

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569287

KEYWORDS: Inspection, Reticles, Manufacturing, Photomasks, Etching, Defect detection, Lithography, Quartz, Sensors, Resolution enhancement technologies

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Proceedings Article | 20 August 2004 Paper

Results from a new die-to-database reticle inspection platform

William Broadbent, James Wiley, Zain Saidin, Sterling Watson, David Alles, Larry Zurbrick, Chris Mack

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557784

KEYWORDS: Reticles, Inspection, Sensors, Lithography, Databases, Quartz, Image transmission, Defect detection, Deep ultraviolet, Image processing

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Proceedings Article | 20 August 2004 Paper

An analysis of in-process pattern inspection benefit-to-cost relationship

Larry Zurbrick

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557729

KEYWORDS: Inspection, Reticles, Manufacturing, Etching, Attenuators, Neodymium, Resolution enhancement technologies, Quartz, Vestigial sideband modulation, Photomasks

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Proceedings Article | 24 May 2004 Paper

Defect inspection of Quartz-PSMs: taking a leap forward

Jan Heumann, Frank Schurack, Wolfgang Dettmann, Larry Zurbrick, Michael Lang

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.534057

KEYWORDS: Quartz, Inspection, Photomasks, Defect detection, Defect inspection, Phase shifts, Algorithm development, Semiconducting wafers, Detection and tracking algorithms, Lithography

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Proceedings Article | 17 December 2003 Paper

Results from a new reticle defect inspection platform

William Broadbent, James Wiley, Zain Saidin, Sterling Watson, David Alles, Larry Zurbrick, Chris Mack

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518241

KEYWORDS: Reticles, Sensors, Inspection, Lithography, Defect detection, Image processing, Manufacturing, SRAF, Image transmission, Image resolution

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Proceedings Article | 17 December 2003 Paper

Phase-enhanced DUV inspection of alternating phase-shift reticles

Larry Zurbrick, Maciej Rudzinski, Long He, Kurt Kimmel, Alvina Williams

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518143

KEYWORDS: Inspection, Reticles, Defect detection, Manufacturing, Photomasks, Deep ultraviolet, Phase contrast, Quartz, Computer aided design, Phase shifts

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Proceedings Article | 28 May 2003 Paper

Inspection of alternating phase-shift masks through the use of phase contrast techniques

Larry Zurbrick, Maciej Rudzinski, Stanley Stokowski, Long He, Kurt Kimmel, Nishrin Kashwala

Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.515102

KEYWORDS: Inspection, Quartz, Defect detection, Phase contrast, Photomasks, Etching, Lithography, Detection and tracking algorithms, Phase shift keying, Phase shifts

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Proceedings Article | 27 December 2002 Paper

AltPSM inspection capability and printability of quartz defects

Jan Heumann, Mardjan Zarrabian, Mario Hennig, Wolfgang Dettmann, Larry Zurbrick, Michael Lang

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467498

KEYWORDS: Quartz, Photomasks, Inspection, Defect detection, Scanning electron microscopy, Defect inspection, Semiconducting wafers, Resolution enhancement technologies, Algorithm development, Phase shifts

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Proceedings Article | 27 December 2002 Paper

Alternating phase-shift mask inspection through the use of phase contrast enhancement techniques

Larry Zurbrick, Maciej Rudzinski, Stanley Stokowski, Long He, Kurt Kimmel, Nishrin Kashwala

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468086

KEYWORDS: Inspection, Quartz, Defect detection, Photomasks, Phase contrast, Lithography, Etching, Manufacturing, Binary data, Phase shifts

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Proceedings Article | 16 August 2002 Paper

Measuring and assessing printability of reticle pinhole defects

Darren Taylor, Anthony Vacca, Larry Zurbrick, William Broadbent, Peter Fiekowsky

Proceedings Volume 4764, (2002) https://doi.org/10.1117/12.479355

KEYWORDS: Reticles, Scanning electron microscopy, Inspection, Semiconducting wafers, Manufacturing, Photomasks, Metrology, Inspection equipment, Calibration, Optics manufacturing

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Proceedings Article | 1 August 2002 Paper

Alternating phase-shift mask inspection using multiple simultaneous illumunation techniques

Larry Zurbrick, Jan Heumann, Maciej Rudzinski, Stanley Stokowski, Jan-Peter Urbach, Lantian Wang

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476919

KEYWORDS: Inspection, Phase shift keying, Defect detection, Phase shifts, Photomasks, Defect inspection, Detection and tracking algorithms, Algorithm development, Quartz, Etching

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Proceedings Article | 1 August 2002 Paper

Improved method for measuring and assessing reticle pinhole defects for the 100-nm lithography node

Darren Taylor, Anthony Vacca, Larry Zurbrick

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476917

KEYWORDS: Scanning electron microscopy, Reticles, Photomasks, Inspection, Lithography, Semiconducting wafers, Metrology, Printing, Inspection equipment, Lithographic illumination

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Proceedings Article | 11 March 2002 Paper

New approaches to alternating phase-shift mask inspection

Larry Zurbrick, Jan Heumann, Maciej Rudzinski, Stanley Stokowski, Jan-Peter Urbach, Lantian Wang

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458285

KEYWORDS: Inspection, Phase shifts, Photomasks, Defect detection, Reticles, Etching, Quartz, Algorithm development, Image transmission, Semiconducting wafers

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Proceedings Article | 11 March 2002 Paper

Improved method for measuring and assessing reticle pinhole defects

Darren Taylor, Anthony Vacca, Larry Zurbrick, William Howard, William Broadbent

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458300

KEYWORDS: Reticles, Scanning electron microscopy, Inspection, Semiconducting wafers, Manufacturing, Metrology, Lithography, Scanners, Photomasks, Wafer inspection

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Proceedings Article | 9 April 2001 Paper

Phase defect inspection of 130-nm node phase-shift masks using a simultaneous transmitted and reflected light pattern inspection algorithm

Larry Zurbrick, David Emery, Maciej Rudzinski, Mark Wihl, Michel Prudhomme, Christian Crell, Uwe Griesinger, Manuel Vorwerk, Mario Hennig

Proceedings Volume 4349, (2001) https://doi.org/10.1117/12.425092

KEYWORDS: Inspection, Phase shifts, Defect detection, Reticles, Algorithm development, Photomasks, Detection and tracking algorithms, Defect inspection, Contamination, Signal detection

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Proceedings Article | 19 July 2000 Paper

Reticle defect sizing of optical proximity correction defects using SEM imaging and image analysis techniques

Larry Zurbrick, Lantian Wang, Paul Konicek, Ellen Laird

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392037

KEYWORDS: Optical proximity correction, Scanning electron microscopy, Image analysis, Reticles, Image resolution, Image quality, 3D metrology, Electron microscopes, Photomasks, Computer aided design

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Proceedings Article | 19 July 2000 Paper

Evaluation of printability and inspection of phase defects on hidden-shifter alternating phase-shift masks

Edita Tejnil, Alan Stivers, Richard Schenker, Larry Zurbrick

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392038

KEYWORDS: Glasses, Inspection, Etching, Wet etching, Photomasks, Defect inspection, Defect detection, Semiconducting wafers, Optical lithography, Interference (communication)

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Proceedings Article | 3 February 2000 Paper

Reticle programmed defect size measurement using low-voltage SEM and pattern recognition techniques

Larry Zurbrick, Steve Khanna, Jay Lee, James Greed, Ellen Laird, Rene Blanquies

Proceedings Volume 3996, (2000) https://doi.org/10.1117/12.377119

KEYWORDS: Scanning electron microscopy, Optical testing, LCDs, Reticles, Pattern recognition, Photomasks, Critical dimension metrology, Very large scale integration, Defect inspection, Inspection equipment

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Proceedings Article | 30 December 1999 Paper

High-resolution ultraviolet defect inspection of DAP (darkfield alternate phase) reticles

Lars Liebmann, Scott Mansfield, Alfred Wong, Jacek Smolinski, Song Peng, Kurt Kimmel, Maciej Rudzinski, James Wiley, Larry Zurbrick

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373310

KEYWORDS: Reticles, Inspection, Photomasks, Quartz, Defect inspection, Manufacturing, Binary data, Etching, Semiconducting wafers, Scanning electron microscopy

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Proceedings Article | 30 December 1999 Paper

Reticle defect size calibration using low-voltage SEM and pattern recognition techniques for sub-200-nm defects

Larry Zurbrick, Steve Khanna, Jay Lee, James Greed, Ellen Laird, Rene Blanquies

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373361

KEYWORDS: Scanning electron microscopy, Optical testing, Reticles, LCDs, Pattern recognition, Calibration, Defect inspection, Inspection equipment, Inspection, Photomasks

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Proceedings Article | 25 August 1999 Paper

Reticle OPC defect printability and detectability for 180-nm technology

Maciej Rudzinski, Larry Zurbrick, Donald Pettibone, Mohan Ananth

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360249

KEYWORDS: Semiconducting wafers, Reticles, Optical proximity correction, Inspection, Defect detection, Critical dimension metrology, Scanning electron microscopy, Photomasks, Deep ultraviolet, Databases

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Proceedings Article | 14 June 1999 Paper

Wafer printability simulation accuracy based on UV optical inspection images of reticle defects

Donald Pettibone, Mohan Ananth, Maciej Rudzinski, Sterling Watson, Larry Zurbrick, Hua-Yu Liu, Linard Karklin

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350857

KEYWORDS: Reticles, Semiconducting wafers, Scanning electron microscopy, Optical inspection, Cadmium sulfide, Photomasks, Wafer-level optics, Inspection, 3D modeling, Manufacturing

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Proceedings Article | 23 April 1999 Paper

Characterization of inspection sensitivity on advanced OPC reticles

Larry Zurbrick, Joseph Straub, Anthony Vacca

Proceedings Volume 3665, (1999) https://doi.org/10.1117/12.346219

KEYWORDS: Optical proximity correction, Inspection, Photomasks, Reticles, Defect inspection, Defect detection, Detection and tracking algorithms, Semiconducting wafers, Scanning electron microscopy, Visualization

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Proceedings Article | 18 December 1998 Paper

Defect inspection capability for advanced OPC photomasks

Joseph Straub, Anthony Vacca, Larry Zurbrick

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332850

KEYWORDS: Optical proximity correction, Reticles, Defect inspection, Inspection, Photomasks, Defect detection, Manufacturing, Scanning electron microscopy, Semiconducting wafers, Inspection equipment

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Proceedings Article | 1 September 1998 Paper

Detection of 60-deg phase defects on alternating PSMs

Chris Spence, David Emery, Larry Zurbrick, Durai Prakash, X. Chang, Steve Khanna, Brent Leback, Eiji Tsujimoto, Greg Hughes, Baorui Yang

Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328859

KEYWORDS: Inspection, Reticles, Photomasks, Deep ultraviolet, Detection and tracking algorithms, Algorithm development, Defect detection, Phase shifts, Semiconducting wafers, Etching

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Proceedings Article | 1 September 1998 Paper

Reticle defects on optical proximity correction features

Larry Zurbrick

Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328858

KEYWORDS: Optical proximity correction, Inspection, Reticles, Defect detection, Detection and tracking algorithms, Photomasks, Semiconducting wafers, Defect inspection, Ultraviolet radiation, Lithography

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Proceedings Article | 8 June 1998 Paper

Defect inspection and linewidth measurement of SCALPEL thin membrane masks using optical transmission

Reginald Farrow, Myrtle Blakey, Richard Kasica, James Liddle, Masis Mkrtchyan, Anthony Novembre, Milton Peabody, Thomas Saunders, David Windt, Larry Zurbrick, James Wiley, Christopher Aquino, Steve Hentschel, Larry Davis, B. Boyer

Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308730

KEYWORDS: Photomasks, Charged-particle lithography, Inspection, Defect inspection, Scanning electron microscopy, Defect detection, Transmittance, Optical testing, Integrated optics, Optical inspection

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Proceedings Article | 12 February 1997 Open Access

Detection of submicron phase defects on multiphase random logic reticles

Chris Spence, John Nistler, William Arnold, David Emery, Larry Zurbrick, Durai Prakash, X. Chang, Steve Khanna, Brent Leback, Eiji Tsujimoto, Greg Hughes

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301195

KEYWORDS: Inspection, Reticles, Detection and tracking algorithms, Photomasks, Deep ultraviolet, Etching, Phase shift keying, Algorithm development, Defect detection, Phase shifts

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Proceedings Article | 7 December 1994 Paper

Meeting the challenge of advanced lithography reticle inspection

Larry Zurbrick, Stephen Kirkish

Proceedings Volume 2322, (1994) https://doi.org/10.1117/12.195814

KEYWORDS: Inspection, Reticles, Databases, Defect detection, Optical proximity correction, Photomasks, Lithography, Deep ultraviolet, Semiconducting wafers, Phase shifts

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Proceedings Article | 17 May 1994 Paper

Effects of transparent and transmission reduction reticle defects

Larry Zurbrick, Steven Schuda, James Wiley

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175417

KEYWORDS: Reticles, Semiconducting wafers, Silicon, Inspection, Phase shifts, Photoresist processing, Defect inspection, Defect detection, Lithography, Quartz

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Proceedings Article | 15 February 1994 Paper

Fabrication and evaluation of a programmed transmission defect test mask

Larry Zurbrick, Paul DePesa, Ricardo Diola

Proceedings Volume 2087, (1994) https://doi.org/10.1117/12.167265

KEYWORDS: Photomasks, Defect detection, Semiconducting wafers, Reticles, Defect inspection, Inspection, Lithography, Chromium, Detection and tracking algorithms, Spectroscopy

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