Mr. Jungchan Kim Profile

Jungchan Kim

at SK Hynix Inc

SPIE Involvement:

Author

Publications (24)

Proceedings Article | 27 April 2023 Poster + Paper

Poster + Paper

Residuals reduction in imaging-based overlay using color per layer

Shlomit Katz, Suk Won Park, Joonsang You, Hyunjun Kim, Honggoo Lee, Jungchan Kim, Dongyoung Lee, Hongbok Yeon, Joonseuk Lee, Sang-Ho Lee, Jae Wook Seo, Dor Yehuda, Junho Kim, Hongcheon Yang, Dohwa Lee, Nanglyeom Oh, Dongsub Choi, Wayne Zhou, Hedvi Spielberg, Ohad Bachar

Proceedings Volume 12496, 1249626 (2023) https://doi.org/10.1117/12.2655681

KEYWORDS: Metrology, Overlay metrology, High volume manufacturing, Optical parametric oscillators, Optical gratings, Visualization

Read Abstract +

Proceedings Article | 27 April 2023 Poster + Paper

Poster + Paper

Large field of view metrology: detecting critical edge placement error signatures not seen with small field of view in an HVM environment

Mohamed Ridane, Ivy Chen, Jaden Song, Peter Nikolsky, Kuan-Ming Chen, Shinyeong Lee, Sean Park, Kolos Lin, Yu-Chi Su, Kyoyeon Cho, Ethan Yu, James Park, Abdalmohsen Elmalk, Chih-Hung Hsieh, Alexander Serebryakov, Lei Zhang, Taekwon Jee, Joonsang You, Hong-Goo Lee, Jongmin Park, Jungchan Kim, Sang-Woo Kim, Seungmo Hong, Jaewook Seo

Proceedings Volume 12496, 124963C (2023) https://doi.org/10.1117/12.2659692

KEYWORDS: Metrology, Semiconducting wafers, High volume manufacturing, Line width roughness, Critical dimension metrology, Scanning electron microscopy, Optical lithography, Environmental sensing, Edge detection, Overlay metrology

Read Abstract +

Proceedings Article | 22 February 2021 Presentation + Paper

Presentation + Paper

Edge placement error wafer mapping and investigation for improvement in advanced DRAM node

Kuan-Ming Chen, Wolfgang Henke, Ji-Hoon Jung, Ewa Kasperkiewicz, Anita Bouma, Rizvi Rahman, Gratiela Isai, Gwang-Gon Kim, Sotirios Tsiachris, Jae-Doug Yoo, Yuna Park, JaeYoung Park, Jonggeun Won, Nang-Lyeom Oh, Hsin-Yu Chen, WeiTai Lin, Chih-Hung Hsieh, Kuo-Feng Pao, Kyoyeon Cho, Abdalmohsen Elmalk, Sudharshanan Raghunathan, Taekwon Jee, Seung-Uk Jeong, Jeongwoo Jae, Sang-Woo Kim, Dongyoung Lee, Jungchan Kim, WonKwang Ma, Sang-Ho Lee, Chan-Ha Park

Proceedings Volume 11611, 116111V (2021) https://doi.org/10.1117/12.2584149

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Overlay metrology, Optical lithography, Metrology, Visualization, Statistical analysis, Lithography, Graphic design, Etching

Read Abstract +

Proceedings Article | 24 March 2016 Paper

Paper

Enhacement of intrafield overlay using a design based metrology system

Gyoyeon Jo, Sunkeun Ji, Shinyoung Kim, Hyunwoo Kang, Minwoo Park, Sangwoo Kim, Jungchan Kim, Chanha Park, Hyunjo Yang, Kotaro Maruyama, Byungjun Park

Proceedings Volume 9778, 97781J (2016) https://doi.org/10.1117/12.2218937

KEYWORDS: Overlay metrology, Metrology, Optical testing, Defect inspection, Inspection, Defect detection, Control systems, Semiconductors, Databases, Distortion, Chemical mechanical planarization, Etching

Read Abstract +

Proceedings Article | 19 March 2015 Paper

Paper

Advanced overlay analysis through design based metrology

Sunkeun Ji, Gyun Yoo, Gyoyeon Jo, Hyunwoo Kang, Minwoo Park, Jungchan Kim, Chanha Park, Hyunjo Yang, Donggyu Yim, Kotaro Maruyama, Byungjun Park, Masahiro Yamamoto

Proceedings Volume 9424, 942415 (2015) https://doi.org/10.1117/12.2085464

KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Data analysis, Etching, Optical lithography, Double patterning technology, Imaging systems, Error analysis, Distortion

Read Abstract +

Proceedings Article | 2 April 2014 Paper

Paper

Real cell overlay measurement through design based metrology

Gyun Yoo, Jungchan Kim, Chanha Park, Taehyeong Lee, Sunkeun Ji, Gyoyeon Jo, Hyunjo Yang, Donggyu Yim, Masahiro Yamamoto, Kotaro Maruyama, Byungjun Park

Proceedings Volume 9050, 90501O (2014) https://doi.org/10.1117/12.2046294

KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Computer aided design, Manufacturing, Inspection, Scanning electron microscopy, Image processing, Data processing, Metals

Read Abstract +

Until recent device nodes, lithography has been struggling to improve its resolution limit. Even though next generation lithography technology is now facing various difficulties, several innovative resolution enhancement technologies, based on 193nm wavelength, were introduced and implemented to keep the trend of device scaling. Scanner makers keep developing state-of-the-art exposure system which guarantees higher productivity and meets a more aggressive overlay specification. “The scaling reduction of the overlay error has been a simple matter of the capability of exposure tools. However, it is clear that the scanner contributions may no longer be the majority component in total overlay performance. The ability to control correctable overlay components is paramount to achieve the desired performance.(2)” In a manufacturing fab, the overlay error, determined by a conventional overlay measurement: by using an overlay mark based on IBO and DBO, often does not represent the physical placement error in the cell area of a memory device. The mismatch may arise from the size or pitch difference between the overlay mark and the cell pattern. Pattern distortion, caused by etching or CMP, also can be a source of the mismatch. Therefore, the requirement of a direct overlay measurement in the cell pattern gradually increases in the manufacturing field, and also in the development level. In order to overcome the mismatch between conventional overlay measurement and the real placement error of layer to layer in the cell area of a memory device, we suggest an alternative overlay measurement method utilizing by design, based metrology tool. A basic concept of this method is shown in figure1. A CD-SEM measurement of the overlay error between layer 1 and 2 could be the ideal method but it takes too long time to extract a lot of data from wafer level. An E-beam based DBM tool provides high speed to cover the whole wafer with high repeatability. It is enabled by using the design as a reference for overlay measurement and a high speed scan system. In this paper, we have demonstrated that direct overlay measurement in the cell area can distinguish the mismatch exactly, instead of using overlay mark. This experiment was carried out for several critical layer in DRAM and Flash memory, using DBM(Design Based Metrology) tool, NGR2170™.

Proceedings Article | 18 April 2013 Paper

Paper

Application of DBM tool for detection of EUV mask defect

Gyun Yoo, Jungchan Kim, Chanha Park, Taehyeong Lee, Sunkeun Ji, Hyunjo Yang, Donggyu Yim, Byeongjun Park, Kotaro Maruyama, Masahiro Yamamoto

Proceedings Volume 8681, 868121 (2013) https://doi.org/10.1117/12.2011476

KEYWORDS: Photomasks, Inspection, Wafer inspection, Semiconducting wafers, Metals, Extreme ultraviolet, Extreme ultraviolet lithography, Metrology, Defect inspection, Lithography

Read Abstract +

Proceedings Article | 12 April 2013 Paper

Paper

Mask compensation for process flare in 193nm very low k1 lithography

Jeonkyu Lee, Taehyeong Lee, Sangjin Oh, Chunsoo Kang, Jungchan Kim, Jaeseung Choi, Chanha Park, Hyunjo Yang, Donggyu Yim, Munhoe Do, Irene Su, Hua Song, Jung-Hoe Choi, Yongfa Fan, Anthony Wang, Sung-Woo Lee, Robert Boone, Kevin Lucas

Proceedings Volume 8683, 86830F (2013) https://doi.org/10.1117/12.2012463

KEYWORDS: Optical proximity correction, Lithography, Extreme ultraviolet, Transistors, Critical dimension metrology, Model-based design, 193nm lithography, Cadmium, Photomasks, Optical lithography

Read Abstract +

Proceedings Article | 5 April 2012 Paper

Paper

Application of DBM system to overlay verification and wiggling quantification for advanced process

Taehyeong Lee, Jungchan Kim, Gyun Yoo, Chanha Park, Hyunjo Yang, Donggyu Yim, Byoungjun Park, Kotaro Maruyama, Masahiro Yamamoto

Proceedings Volume 8324, 83241B (2012) https://doi.org/10.1117/12.916110

KEYWORDS: Overlay metrology, Semiconducting wafers, Inspection, Process control, Metrology, Semiconductors, Etching, Array processing, Control systems, Line edge roughness

Read Abstract +

Proceedings Article | 20 April 2011 Paper

Paper

OPC verification and hotspot management for yield enhancement through layout analysis

Gyun Yoo, Jungchan Kim, Taehyeong Lee, Areum Jung, Hyunjo Yang, Donggyu Yim, Sungki Park, Kotaro Maruyama, Masahiro Yamamoto, Abhishek Vikram, Sangho Park

Proceedings Volume 7971, 79710H (2011) https://doi.org/10.1117/12.870395

KEYWORDS: Optical proximity correction, Semiconducting wafers, Image classification, Transistors, Manufacturing, Tolerancing, Optical lithography, Inspection, OLE for process control, Semiconductors

Read Abstract +

Proceedings Article | 23 March 2011 Paper

Paper

Scanner matching using pupil intensity control between scanners in 30nm DRAM device

Jongwon Jang, Daejin Park, Jeaseung Choi, Areum Jung, Gyun Yoo, Jungchan Kim, Cheol-kyun Kim, Donggyu Yim, Junwei Lu, Seunghoon Park, Zongchang Yu, Venu Vellanki, Wenkin Shao, Chris Park

Proceedings Volume 7973, 79730S (2011) https://doi.org/10.1117/12.879570

KEYWORDS: Scanners, Critical dimension metrology, Semiconducting wafers, Cadmium, Calibration, Data modeling, Computer simulations, Metrology, Control systems, Lithography

Read Abstract +

Proceedings Article | 2 April 2010 Paper

Paper

Systematic and random defects control with design-based metrology

Hyunjo Yang, Jungchan Kim, Taehyeong Lee, Areum Jung, Gyun Yoo, Donggyu Yim, Sungki Park, Toshiaki Hasebe, Masahiro Yamamoto

Proceedings Volume 7638, 76380I (2010) https://doi.org/10.1117/12.846739

KEYWORDS: Inspection, Defect detection, Metrology, Control systems, Semiconducting wafers, Process control, Computer aided design, Design for manufacturing, Bridges, Resolution enhancement technologies

Read Abstract +

Proceedings Article | 14 December 2009 Paper

Paper

Hot spot management through design based metrology: measurement and filtering

Taehyeong Lee, Hyunjo Yang, Jungchan Kim, Areum Jung, Gyun Yoo, Donggyu Yim, Sungki Park, Akio Ishikawa, Masahiro Yamamoto, Abhishek Vikram

Proceedings Volume 7520, 75201U (2009) https://doi.org/10.1117/12.837228

KEYWORDS: Optical proximity correction, Metrology, Semiconducting wafers, Inspection, Metals, Error analysis, Process control, OLE for process control, Design for manufacturing, Electronic design automation

Read Abstract +

Proceedings Article | 24 March 2009 Paper

Paper

Systematic defect filtering and data analysis methodology for design based metrology

Hyunjo Yang, Jungchan Kim, Taehyeong Lee, Areum Jung, Gyun Yoo, Donggyu Yim, Sungki Park, Toshiaki Hasebe, Masahiro Yamamoto, Jun Cai

Proceedings Volume 7272, 72721C (2009) https://doi.org/10.1117/12.814373

KEYWORDS: Computer aided design, Metrology, Semiconducting wafers, Electronic design automation, Metals, Inspection, Optical proximity correction, Data analysis, Error analysis, Design for manufacturing

Read Abstract +

Proceedings Article | 16 March 2009 Paper

Paper

Novel OPC method to create sub 45nm contact hole using design based metrology

Dong-Jin Lee, Se-young Oh, Jong-cheon Park, Jin-young Choi, Jungchan Kim, Cheolkyun Kim, Donggyu Yim

Proceedings Volume 7274, 72742C (2009) https://doi.org/10.1117/12.814386

KEYWORDS: Optical proximity correction, Critical dimension metrology, Metrology, Printing, Overlay metrology, Data modeling, Photomasks, Semiconductors, Systems modeling

Read Abstract +

Proceedings Article | 4 December 2008 Paper

Paper

The APC (Advanced Process Control) procedure for process window and CDU improvement using DBMs

Jung-Chan Kim, Taehyeong Lee, Areum Jung, Gyun Yoo, Hyunjo Yang, Donggyu Yim, Sungki Park, Jaeyoung Seo, Byoungjun Park, Toshiaki Hasebe, Masahiro Yamamoto

Proceedings Volume 7140, 71403G (2008) https://doi.org/10.1117/12.804652

KEYWORDS: Semiconducting wafers, Inspection, Photomasks, Critical dimension metrology, Metrology, Computer aided design, Process control, Yield improvement, Design for manufacturing, Scanning electron microscopy

Read Abstract +

Proceedings Article | 4 December 2008 Paper

Paper

CD uniformity improvement of sub 60nm contact hole using model based OPC

Hyoung-Soon Yune, Yeong-Bae Ahn, Jung-Chan kim, Hye-Jin Shin, Gyun Yoo, James Moon, Byoung-Sub Nam, Donggyu Yim

Proceedings Volume 7140, 71403E (2008) https://doi.org/10.1117/12.804654

KEYWORDS: Optical proximity correction, Critical dimension metrology, Model-based design, Data modeling, Calibration, Semiconducting wafers, Photomasks, Resolution enhancement technologies, Etching, Instrument modeling

Read Abstract +

Proceedings Article | 25 March 2008 Paper

Paper

Wide applications of design based metrology with tool integration

Hyunjo Yang, Jungchan Kim, Areum Jung, Taehyeong Lee, Donggyu Yim, Jinwoong Kim, Toshiaki Hasebe, Masahiro Yamamoto

Proceedings Volume 6922, 692239 (2008) https://doi.org/10.1117/12.772664

KEYWORDS: Semiconducting wafers, Optical proximity correction, Computer aided design, Electronic design automation, Metrology, OLE for process control, Process control, Transistors, Design for manufacturing, Data analysis

Read Abstract +

Proceedings Article | 5 April 2007 Paper

Paper

Advanced process control with design-based metrology

Hyunjo Yang, Jungchan Kim, Jongkyun Hong, Donggyu Yim, Jinwoong Kim, Toshiaki Hasebe, Masahiro Yamamoto

Proceedings Volume 6518, 651821 (2007) https://doi.org/10.1117/12.712051

KEYWORDS: Semiconducting wafers, Optical proximity correction, Computer aided design, Overlay metrology, Process control, Inspection, Design for manufacturing, Resolution enhancement technologies, Metrology, Critical dimension metrology

Read Abstract +

Proceedings Article | 21 March 2007 Paper

Paper

DFM flow by using combination between design-based metrology system and model-based verification at sub-50nm memory device

Cheol-kyun Kim, Jungchan Kim, Jaeseung Choi, Hyunjo Yang, Donggyu Yim, Jinwoong Kim

Proceedings Volume 6521, 65210T (2007) https://doi.org/10.1117/12.711953

KEYWORDS: Design for manufacturing, Critical dimension metrology, Optical proximity correction, Scanning electron microscopy, Metrology, Systems modeling, Transistors, Semiconducting wafers, Calibration, Optical lithography

Read Abstract +

Proceedings Article | 21 March 2007 Paper

Paper

OPC and design verification for DFM using die-to-database inspection

JungChan Kim, HyunJo Yang, JooKyoung Song, DongGgyu Yim, JinWoong Kim, Toshiaki Hasebe, Masahiro Yamamoto

Proceedings Volume 6521, 652117 (2007) https://doi.org/10.1117/12.711348

KEYWORDS: Critical dimension metrology, Optical proximity correction, Error analysis, Inspection, Design for manufacturing, Computer aided design, Lithography, Semiconducting wafers, Databases, Statistical analysis

Read Abstract +

Proceedings Article | 15 March 2006 Paper

Paper

The improvement of DOF for sub-100nm process by focus scan

Jung-Chan Kim, Hyun-Jo Yang, Jin-Hyuck Jeon, Chan-Ha Park, James Moon, Dong-gyu Yim, Jin-Woong Kim, Shih-en Tseng, Kyu-Kab Rhe, Young-Hong Min, Alek Chen

Proceedings Volume 6154, 61541K (2006) https://doi.org/10.1117/12.656897

KEYWORDS: Semiconducting wafers, Electroluminescence, Fiber optic illuminators, Photomasks, Image processing, Overlay metrology, Resolution enhancement technologies, Optical proximity correction, Photoresist processing, Scanners

Read Abstract +

Proceedings Article | 2 June 2003 Paper

Paper

CD control at low K1 optical lithography in DRAM device

Jongkyun Hong, Chongsik Woo, Jaewoo Park, Byeong-ho Cho, Jaeseung Choi, Hyunjo Yang, Chan-ha Park, Yong-chul Shin, Youngdea Kim, Goomin Jeong, Jung-chan Kim, Khil-ohk Kang, Chunsoo Kang, Jongwoon Park, Donggyu Yim, Youngwook Song

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.485026

KEYWORDS: Compact discs, Optical lithography, Monochromatic aberrations, Control systems, Interferometers, Zernike polynomials, Lithography, Optical proximity correction, Wavefronts, Semiconductors

Read Abstract +

Proceedings Article | 30 July 2002 Paper

Paper

Aberration sensitivity control for the isolation layer in low-k1 DRAM process

Byeong-Ho Cho, Donggyu Yim, Chan-Ha Park, Seung-Hyuk Lee, Hyun-Jo Yang, Jae-Hak Choi, Yong-Chul Shin, Choi-Dong Kim, Jae-Sung Choi, Khil-Ohk Kang, Sang-Wook Kim, Tae-Hwa Yu, Jong-Kyun Hong, Jung-Chan Kim, Min-Seob Han, Ho-Young Heo, Young-Dae Kim, Dong-Duk Lee, Gyu-Han Yoon, Jan van Schoot, Thomas Theeuwes, Young-Hong Min

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474633

KEYWORDS: Diffraction, Lithography, Monochromatic aberrations, Optical lithography, Fourier transforms, Control systems, Phase shifts, Spatial frequencies, Scanners, Photomasks

Read Abstract +

Showing 5 of 24 publications

SIGN IN TO:

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Advertisement

Advertisement