Dr. Seong-Sue Kim Profile

Dr. Seong-Sue Kim

Master

SPIE Involvement:

Conference Program Committee | Author

Publications (35)

Proceedings Article | 24 March 2017

Presentation + Paper

Progress in EUV lithography toward manufacturing

Seong-Sue Kim, Roman Chalykh, Hoyeon Kim, Seungkoo Lee, Changmin Park, Myungsoo Hwang, Joo-On Park, Jinhong Park, Hocheol Kim, Jinho Jeon, Insung Kim, Donggun Lee, Jihoon Na, Jungyeop Kim, Siyong Lee, Hyunwoo Kim, Seok-Woo Nam

Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII

KEYWORDS: Reticles, Logic, Scanners, Manufacturing, Pellicles, Transmittance, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Chemical elements

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Proceedings Article | 28 July 2014 Paper

Paper

Ruthenium (Ru) peeling and predicting robustness of the capping layer using finite element method (FEM) modeling

Il-Yong Jang, Arun John, Frank Goodwin, Su-Young Lee, Byung-Gook Kim, Seong-Sue Kim, Chan-Uk Jeon, Jae Hyung Kim, Yong Hoon Jang

Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI

KEYWORDS: Oxides, Interfaces, Silicon, Oxygen, Finite element methods, Photomasks, Extreme ultraviolet, Neodymium, Ruthenium, Oxidation

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Proceedings Article | 17 April 2014 Paper

Paper

Aerial image deformation caused by various defects of EUV pellicles

Sung-Gyu Lee, Michael Yeung, Eytan Barouch, Mun-Ja Kim, Seong-Sue Kim, Hye-Keun Oh

Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V

KEYWORDS: Carbon, Lithography, Computer simulations, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Ruthenium

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Proceedings Article | 17 April 2014 Paper

Paper

Prospects of DUV OoB suppression techniques in EUV lithography

Chang-Min Park, Insung Kim, Sang-Hyun Kim, Dong-Wan Kim, Myung-Soo Hwang, Soon-Nam Kang, Cheolhong Park, Hyun-Woo Kim, Jeong-Ho Yeo, Seong-Sue Kim

Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V

KEYWORDS: Deep ultraviolet, Etching, Scanners, Particles, Reflectivity, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

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Proceedings Article | 17 April 2014 Paper

Paper

Durability of Ru-based EUV masks and the improvement

Suyoung Lee, Jungyoup Kim, Soo-Wan Koh, Ilyong Jang, Jaehyuck Choi, Hyungho Ko, Hwan-Seok Seo, Seong-Sue Kim, Byung Gook Kim, Chan-Uk Jeon

Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V

KEYWORDS: Silica, Ultraviolet radiation, Annealing, Oxygen, Scanning electron microscopy, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium

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Proceedings Article | 17 April 2014 Paper

Paper

Aerial image of mesh supported extreme ultraviolet pellicle

Ki-ho Ko, Guk-Jin Kim, Michael Yeung, Eytan Barouch, Mun-Ja Kim, Seung-Sue Kim, Hye-Keun Oh

Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V

KEYWORDS: Thin films, Lithography, Silicon, Pellicles, Photomasks, Extreme ultraviolet, Optical simulations, Extreme ultraviolet lithography, Semiconducting wafers, Absorption

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Proceedings Article | 18 March 2014 Paper

Paper

Effect of defects on extreme ultraviolet pellicle

In-Seon Kim, Guk-Jin Kim, Michael Yeung, Eytan Barouch, Mun-Ja Kim, Seong-Sue Kim, Ji-Won Kim, Hye-Keun Oh

Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V

KEYWORDS: Carbon, Lithography, Contamination, Silicon, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Absorption

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Proceedings Article | 28 June 2013 Paper

Paper

Defect printability studies at SEMATECH

Il-Yong Jang, Ranganath Teki, Vibhu Jindal, Frank Goodwin, Masaki Satake, Ying Li, Danping Peng, Sungmin Huh, Seong-Sue Kim

Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX

KEYWORDS: Data modeling, Calibration, Inspection, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Double positive medium

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Proceedings Article | 1 April 2013 Paper

Paper

Effects of multilayer period on EUVL imaging for 2X node and beyond

Su-Young Lee, Hwan-Seok Seo, Tae-Geun Kim, Sang-Hyun Kim, Roman Chalykh, Seong-Sue Kim, Chan-Uk Jeon

Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV

KEYWORDS: Wafer-level optics, Cadmium, Ions, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium, Semiconducting wafers

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Proceedings Article | 1 April 2013 Paper

Paper

Experimental verification of EUV mask limitations at high numerical apertures

Rikon Chao, Paul Graeupner, Eric Gullikson, Seong-Sue Kim, Jens-Timo Neumann, Ryan Miyakawa, Hwan-Seok Seo, Andy Neureuther, Patrick Naulleau

Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV

KEYWORDS: Diffraction, Data modeling, Calibration, Silicon, Reflectivity, Photomasks, Extreme ultraviolet, Molybdenum, Scatter measurement, Ruthenium

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Proceedings Article | 1 April 2013 Paper

Paper

Defect printability comparing actinic printing with advanced simulation for EUV masks

Il-Yong Jang, Ranganath Teki, Vibhu Jindal, Frank Goodwin, Masaki Satake, Ying Li, Danping Peng, Sungmin Huh, Seong-Sue Kim

Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV

KEYWORDS: Inspection, Transmission electron microscopy, Printing, Software development, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Double positive medium

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Proceedings Article | 23 March 2012 Paper

Paper

Printability study of pattern defects in the EUV mask as a function of hp nodes

Tae-Geun Kim, Hwan-Seok Seo, In-Yong Kang, Chang Young Jeong, Sungmin Huh, Jihoon Na, Seong-Sue Kim, Chan-Uk Jeon, Iacopo Mochi, Kenneth Goldberg

Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III

KEYWORDS: Semiconductors, Lithography, Scanners, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers

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Proceedings Article | 23 March 2012 Paper

Paper

Printability and inspectability of defects on EUV blank for 2xnm hp HVM application

Sungmin Huh, In-Yong Kang, Chang Young Jeong, Jihoon Na, Dong Ryul Lee, Hwan-seok Seo, Seong-Sue Kim, Chan-Uk Jeon, Jonggul Doh, Gregg Inderhees, Jinho Ahn

Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III

KEYWORDS: Semiconductors, Defect detection, Inspection, Photomasks, Extreme ultraviolet, Bismuth, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers, Defect inspection

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Proceedings Article | 26 March 2011 Paper

Paper

Printability and inspectability of defects on the EUV mask for sub-32nm half pitch HVM application

Sungmin Huh, In-Yong Kang, Sang-Hyun Kim, Hwan-seok Seo, Dongwan Kim, Jooon Park, Seong-Sue Kim, Han-Ku Cho, Kenneth Goldberg, Iacopo Mochi, Tsutomu Shoki, Gregg Inderhees

Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II

KEYWORDS: Defect detection, Particles, Manufacturing, Inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Defect inspection

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Proceedings Article | 26 May 2010 Paper

Paper

Effect of EUV exposure upon surface residual chemicals on EUV mask surface

Han-Shin Lee, Jaehyuck Choi, DonGun Lee, Hyungho Ko, SeongSu Kim, Chan-Uk Jeon, HanKu Cho

Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII

KEYWORDS: Carbon, Optical lithography, Contamination, Air contamination, Ions, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium

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Proceedings Article | 23 March 2010 Paper

Paper

Influence of mask surface roughness on 22nm node extreme ultraviolet lithography

Eun-Jin Kim, Jee-Hye You, Seoung-Sue Kim, Han-Ku Cho, Jinho Ahn, Ilsin An, Hye-Keun Oh

Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography

KEYWORDS: Carbon, Optical lithography, Contamination, Image processing, Reflectivity, Surface roughness, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium

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Proceedings Article | 20 March 2010 Paper

Paper

Printability and inspectability of programmed pit defects on the masks in EUV lithography

In-Yong Kang, Hwan-Seok Seo, Byung-Sup Ahn, Dong-Gun Lee, Dongwan Kim, Sungmin Huh, Cha-Won Koh, Brian Cha, Seoung-Sue Kim, Han-Ku Cho, Iacopo Mochi, Kenneth Goldberg

Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography

KEYWORDS: Inspection, Atomic force microscopy, Ion beams, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Visibility, Defect inspection

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Proceedings Article | 20 March 2010 Paper

Paper

Absorber stack optimization in EUVL masks: lithographic performances in alpha demo tool and other issues

Hwan-Seok Seo, Dong-Gun Lee, Byung-Sup Ahn, Cha-Won Koh, In-Yong Kang, Tae Geun Kim, Hoon Kim, Dongwan Kim, Seong-Sue Kim, Han-Ku Cho

Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography

KEYWORDS: Lithography, Scanners, Inspection, Electroluminescence, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

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Proceedings Article | 1 April 2009 Paper

Paper

Line edge and width roughness dependency on each ingredient of extreme ultraviolet molecular resist

Hyunsu Kim, In Wook Cho, Seong-Sue Kim, Han-Ku Cho, Hye-Keun Oh

Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI

KEYWORDS: Lithography, Polymers, Image processing, Molecules, Diffusion, Monte Carlo methods, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness

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Proceedings Article | 1 April 2009 Paper

Paper

Reduction of line width and edge roughness by resist reflow process for extreme ultra-violet lithography

In Wook Cho, Joon-Min Park, Hyunsu Kim, Joo-Yoo Hong, Seong-Sue Kim, Han-Ku Cho, Hye-Keun Oh

Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI

KEYWORDS: Lithography, Polymers, Glasses, Diffusion, Surface roughness, Monte Carlo methods, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing

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Proceedings Article | 18 March 2009 Paper

Paper

Incident angle change caused by different off-axis illumination in extreme ultraviolet lithography

Eun-Jin Kim, Jee-Hye You, Seong-Sue Kim, Han-Ku Cho, Ilsin An, Hye-Keun Oh

Proc. SPIE. 7271, Alternative Lithographic Technologies

KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Coherence (optics), Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Resolution enhancement technologies

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Proceedings Article | 18 March 2009 Paper

Paper

Characteristics and issues of an EUVL mask applying phase-shifting thinner absorber for device fabrication

Hwan-Seok Seo, Dong-Gun Lee, Byung-Sup Ahn, Hakseung Han, Sungmin Huh, In-Yong Kang, Hoon Kim, Dongwan Kim, Seong-Sue Kim, Han-Ku Cho

Proc. SPIE. 7271, Alternative Lithographic Technologies

KEYWORDS: Refractive index, Silicon, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Semiconducting wafers, Ruthenium, Phase shifts

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Proceedings Article | 17 October 2008 Paper

Paper

Analysis of process margin in EUV mask repair with nano-machining

Su-Young Lee, Geun-Bae Kim, Hong-Seok Sim, Sang-Hyeon Lee, Hwa-Sung Kim, Jung-Hwan Lee, Hwan-Seok Seo, Hak-Seung Han, Seong-Sue Kim, Seong-Yong Moon, Sang-Gyun Woo, Ron Bozak, Andrew Dinsdale, Tod Robinson, David Lee, HanKu Cho

Proc. SPIE. 7122, Photomask Technology 2008

KEYWORDS: Diffractive optical elements, Image processing, Error analysis, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Factor analysis

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Proceedings Article | 27 March 2008 Paper

Paper

Lifetime of EUVL masks as a function of degree of carbon contamination and capping materials

Sungmin Huh, Hoon Kim, Gisung Yoon, Jaehyuck Choi, Han-Shin Lee, Dong Gun Lee, Byungsup Ahn, Hwan-Seok Seo, Dongwan Kim, Seoung Sue Kim, Han Ku Cho, Takeo Watanabe, Hiroo Kinoshita

Proc. SPIE. 6921, Emerging Lithographic Technologies XII

KEYWORDS: Carbon, Contamination, Silicon, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Ruthenium

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Proceedings Article | 5 April 2007 Paper

Paper

Image analysis of alignment and overlay marks with compound structure

Roman Chalykh, Irina Pundaleva, Jang-Ho Shin, Seong-Sue Kim, Han-Ku Cho, Joo-Tae Moon

Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI

KEYWORDS: Semiconductors, Antireflective coatings, Finite-difference time-domain method, Optical lithography, Coating, Image analysis, Image quality, Optical alignment, Semiconducting wafers, Overlay metrology

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Proceedings Article | 5 April 2007 Paper

Paper

Overlay metrology for dark hard mask process: simulation and experiment study

Jangho Shin, Roman Chalykh, Hyunjae Kang, SeongSue Kim, SukJoo Lee, Han-Ku Cho

Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI

KEYWORDS: Semiconductors, Lithography, Image processing, Scanners, Photoresist materials, Image quality, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology

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Proceedings Article | 21 March 2007 Paper

Paper

Properties of EUVL masks as a function of capping layer and absorber stack structures

Hwan-Seok Seo, Jinhong Park, Seung-Yoon Lee, Joo-On Park, Hun Kim, Seong-Sue Kim, Han-Ku Cho

Proc. SPIE. 6517, Emerging Lithographic Technologies XI

KEYWORDS: Refractive index, Multilayers, Silicon, Reflectivity, Ion beams, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Molybdenum, Ruthenium

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Proceedings Article | 20 March 2007 Paper

Paper

The effect of localized mask density variations on image quality in EUV lithography

Jinhong Park, Hwanseok Seo, Seong-Sue Kim, HanKu Cho, Joo-Tae Moon

Proc. SPIE. 6517, Emerging Lithographic Technologies XI

KEYWORDS: Lithography, Reticles, Light scattering, Reflectivity, Image quality, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Stray light

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Proceedings Article | 20 October 2006 Paper

Paper

Simulation of critical dimension and profile metrology based on scatterometry method

Roman Chalykh, Irina Pundaleva, SeongSue Kim, Han-Ku Cho, Joo-Tae Moon

Proc. SPIE. 6349, Photomask Technology 2006

KEYWORDS: Diffraction, Metrology, Polarization, Light scattering, Magnetism, Scatterometry, Critical dimension metrology, Scatter measurement, Overlay metrology, Diffraction gratings

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Proceedings Article | 20 May 2006 Paper

Paper

Simulation and experiments for inspection properties of EUV mask defects

Jinhong Park, Seong-Sue Kim, SukJoo Lee, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII

KEYWORDS: Confocal microscopy, Visible radiation, Defect detection, Deep ultraviolet, Imaging systems, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Semiconducting wafers

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Proceedings Article | 23 March 2006 Paper

Paper

Defect inspection of EUV mask blank using confocal microscopy: simulation and experiment

Seong-Sue Kim, Jinhong Park, Roman Chalykh, Jiehun Kang, SukJoo Lee, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proc. SPIE. 6151, Emerging Lithographic Technologies X

KEYWORDS: Confocal microscopy, Microscopes, Data modeling, Silicon, Smoothing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Molybdenum, Defect inspection

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Proceedings Article | 12 May 2005 Paper

Paper

Measurement technique of nontelecentricity of pupil-fill and its application to 60 nm NAND flash memory patterns

Jangho Shin, SukJoo Lee, Hochul Kim, Chan Hwang, SeongSue Kim, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proc. SPIE. 5754, Optical Microlithography XVIII

KEYWORDS: Reticles, Metrology, Optical lithography, Scanners, Photoresist materials, Image sensors, Semiconducting wafers, Optics manufacturing, Overlay metrology, Fiber optic illuminators

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Proceedings Article | 10 May 2005 Paper

Paper

Optimization of geometry of alignment mark using rigorous coupled-wave analysis (RCWA)

Roman Chalykh, Seong-Sue Kim, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX

KEYWORDS: Diffraction, Finite-difference time-domain method, Silica, Image quality, Near field, Signal processing, Extreme ultraviolet, Optical alignment, Overlay metrology, Diffraction gratings

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Proceedings Article | 6 May 2005 Paper

Paper

Defect printability and defect inspection simulations of patterned EUVL mask using rigorous coupled-wave analysis

Seong-Sue Kim, Roman Chalyck, Sang-Gyun Woo, Han-Ku Cho

Proc. SPIE. 5751, Emerging Lithographic Technologies IX

KEYWORDS: Confocal microscopy, Light sources, Inspection, Near field, Projection systems, Photomasks, Extreme ultraviolet lithography, Fourier optics, Near field optics, Defect inspection

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Proceedings Article | 28 May 2004 Paper

Paper

Image simulation in immersion lithography using Debye integral and scattering matrix method

Seong-Sue Kim, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han

Proc. SPIE. 5377, Optical Microlithography XVII

KEYWORDS: Infrared imaging, Lithography, Polarization, Scattering, Water, Reflectivity, Wavefronts, Wave propagation, Photomasks, Immersion lithography

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Showing 5 of 35 publications

Conference Committee Involvement (12)

Extreme Ultraviolet (EUV) Lithography XII

22 February 2021 | Online Only, California, United States

Extreme Ultraviolet (EUV) Lithography XI

24 February 2020 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography X

25 February 2019 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography IX

26 February 2018 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography VIII

27 February 2017 | San Jose, California, United States

Showing 5 of 12 Conference Committees

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